1 / 9

High-k metal gate precursor market grow at 22% CAGR from 2016 to 2024

Request Sample of Report @ http://bit.ly/2pREwWR<br>High-k metal gate precursor market share will grow at over 22% CAGR estimations from 2016 to 2024. These have considerable potential for replacment of silicon oxide in the 65 nm CMOS technology space. The major requirements include thermal and chemical stability, a high dielectric constant, and high band offset with electrodes. <br>

Devesh
Download Presentation

High-k metal gate precursor market grow at 22% CAGR from 2016 to 2024

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Global High-k and ALD/CVD Metal Precursor Market to grow at 7.8% CAGR from 2016 to 2024: Fractovia.org

  2. Key Insights ofHigh-k and ALD/CVD Metal Precursor Market: • global high-k and ALD/CVD metal precursor market size is projected to exceed USD 965 million by the year 2024, with a CAGR estimation of 17.8% over 2016-2024. Global high-k and ALD/CVD metal precursor market is characterized by notable number of players offering diverse and cost-effective solutions. • The ever-growing demand for highly efficient semiconductor devices will propel high-k and ALD/CVD metal precursor market. Subject to the advantages of compositional control and industrial scaling, deposition processes such as metal organic chemical vapor deposition have gained traction, as opposed to the conventional physical vapor deposition techniques. This will significantly drive high-k & ALD/CVD metal precursor industry. • The Asia Pacific and BRIC nations experience an ever-growing demand for efficient semiconductors subject to the high utilization of electronic devices in the region. On account of this, China high-k & ALD/CVD metal precursor market, having accounted for more than 35% of the overall share in 2015, will experience heavy gains over 2016-2024.

  3. Continued… • Taiwan is estimated to host the largest number of chip makers and a huge customer pool, owing to which the country is touted to be a major revenue pocket for Asia Pacific industry. • U.S. high-k and ALD/CVD metal precursor market size was over USD 30 million in 2015. The regional manufacturers have scaled down wafer processing to 450 mm, which will propel U.S. microelectronics and nanotechnology industries. High demand from the aforementioned sectors and the complexities involved in manufacturing semiconductors will drive U.S. market. • Subject to technological trends, high-k and ALD/CVD metal precursor industry encompasses gate, memory/capacitor, and interconnect technology. Gate based high-k and ALD/CVD metal precursor industry was worth USD 33 million in 2015, and is slated to grow at a CAGR of 23% over 2016-2024. • This technology is likely to replace silicon oxide in the 65 nm CMOS devices. In addition, the demand for timely and accurate translation of a large amount of content will fuel gate based technology.

  4. U.S. high-k and ALD/CVD metal precursor market size, by technology, 2013-2024 (USD Million)

  5. Browse Full Market Research Report Of FPGA Market @ http://bit.ly/2r7coQP Request for a Sample of this Research report @ https://www.fractovia.org/request-sample/425

  6. Continued… • Interconnect technology contributed to more than 45% of the overall high-k & ALD/CVD metal precursor market in 2015, thereby dominating the technology landscape. High demand for new memory technologies and non-planar transistors will lead to thin film material suppliers gaining renewed opportunities, which will stimulate interconnect based high-k and ALD/CVD metal precursor industry over the years to come. • Major participants operating in worldwide high-k and ALD/CVD metal precursor market include Air Liquide, Air Products & Chemicals, ATMI Inc., Adeka, UPChem, and Dow Chemical. In a bid to innovate products and achieve high profit margins, companies adopt growth strategies such as joint ventures, collaborations, and mergers & acquisitions to strengthen their presence across the supply chain and consolidate their position in the global industry.

  7. Table Contents of High-k and ALD/CVD Metal Precursor: Chapter 1. Methodology and Scope 1.1. Research Methodology 1.1.1. Initial data exploration 1.1.2. Statistical model and forecast 1.1.3. Industry insights and validation 1.1.4. Research scope & assumptions 1.2. Data Sources 1.2.1. Primary 1.2.2. Secondary Chapter 2. Executive Summary 2.1. High-k and ALD/CVD metal precursor industry 3600 synopsis, 2013 - 2024 2.1.1. Business trends 2.1.2. Regional trends 2.1.3. Product trends

  8. Continued… Chapter 3. High-k and ALD/CVD Metal Precursor Industry Insights 3.1. Industry segmentation 3.2. Industry Size and forecast, 2013 - 2024 3.3. Industry ecosystem analysis 3.3.1. Precursors market trends 3.4 Technological & innovation landscape 3.5 Industry Impact forces 3.5.1 Growth drivers 3.5.1.1 Rising demand for sophisticated products 3.5.1.2 Superior customer service 3.5.2 Industry pitfalls & challenges 3.5.2.1 High auxiliary expenses 3.6. Growth potential analysis 3.7. Porter’s analysis 3.8. Competitive landscape, 2015 3.8.1. Strategy dashboard 3.9. PESTEL analysis

  9. Stay In Touch Website: https://www.fractovia.org Social Media:

More Related