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ITO (indium tin oxide) sputtering targets are one of the core and critical materials in electronic information area, mainly for the manufacture of flat panel liquid crystal displays, touch panel, thin film transistors, solar cells, transparent electrodes and multifunction glass. To Read Complete Report with Toc: http://www.marketresearchreports.biz/analysis/206206
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GlobalAndChinaITOSputteringTargetsIndustryReport,2013- 2016 ITO(indiumtinoxide)sputteringtargetsareoneofthecoreand criticalmaterialsinelectronicinformationarea,mainlyforthemanufactureofflatpanelliquidcrystaldisplays,touchpanel,thin
filmtransistors,solarcells,transparentelectrodesand multifunctionglass. ToReadCompleteReportwithToc: http://www.marketresearchreports.biz/analysis/206206 Currently,globalITOsputteringtargetsarealmostmonopolized asmallminorityofenterprisessuchasJXNipponMining& by Metals,MitsuiMining,Tosoh,Samsung,HeraeusandUmicore,in whichJapaneseandKoreancompaniesaccountfornearly80%ofthemarketshare.Forlackofcoretechnology,ChineseITOsputteringtargetenterprisesarestillsmallinproductionscale,andbasicallyintrialproductionorsmallbatchproduction.
GlobalITOsputteringtargetdemandmainlycomesfromJapan, SouthKorea,mainlandChinaandotherAsiancountries,ofwhichChinaaccountsformorethan35%ofthetotal.Benefitedfromtherapiddevelopmentofdownstreamindustriessuchasflatpaneldisplays,touchpanels,etc.,globalITOsputteringtargetdemandwillhit2,500tonsorsoby2016,ofwhichChina’sdemandwillexceed40%,asitisestimated. BrowseFullReportWithToc: http://www.marketresearchreports.biz/analysis-details/global-and-china-ito-sputtering-targets-industry-report-2013-2016 Inadditiontosupply&demandmarketinfluence,ITOsputtering targetsarealsodirectlyaffectedbyrawmaterialindiummarket.
70%oftheglobalindiumisusedforITOsputteringtarget production,buttheindiumresourceisveryscarce,withbasicreservesmerely16,000tons.Whilethecurrentglobalannualconsumptionisabout1,400tons,thus,long-termsupplyofindiumwillsufferbottlenecks. Chinaisrichisindiumintheworld,whosebasicreservesmake up62%oftheworld’stotal.Slowdevelopmentsindownstreamdeepprocessingindustries,especiallyinITOsputteringtargetmarket,leadtosubstantialindiumexportinChina,whileITOsputteringtargetpresentahighdependenceonimport. Inordertobreakbottlenecksintechnologyandcapacityand utilizeindiumresourceeffectively,Chineseenterpriseshave
acceleratedR&DandintroductionofITOsputteringtechnologyand multiplehigh-endITOsputteringtargetlocalizationprojects beenlaunched. have ClickHereToDownloadDetailReport: http://www.marketresearchreports.biz/sample/sample/206206 ZhuzhouSmelterGroupCo.,Ltd.:ithastrial-producedITO sinteredsputteringtargetviamechanicalmixingmethodby virtue oftechnologicalbreakthroughssince2008;in2013,its10-tonITO sinteredsputteringtargetproductionlinewasputintotrialproduction,whichshowedagoodeffectinpreliminarytrialplating.
ChinaTinGroupCo.,Ltd.:ithasbuiltacompleteITOsputtering targetprocessofhot-pressapproachandhightemperaturesintering method,whichproducesJinhaiITOsputteringtargets;inNov. 2013,itintroducedone50-tonITOsputteringtargetproduction linefromTaiwai,whichwasusedtoproducehigh-endITO sputteringtargetsforTET-LCDas planned. ShaoguanSigmaTechnologyCo., targetfieldin2002,itdevelopedsputteringtargetinJan.2008;in Ltd.:embarkedonITOsputtering high-densitylarge-sized Sep.2011,itcompletedITO sputteringtargetproductionlinewithannualcapacityof20tons, whichwastobeliftedto100tonsin2015asitwasplaned.
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