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PDMS processing & devices. PDMS. PDMS. 1 st master. 3 rd substrate. active channel. control channel. PDMS. 2 nd master. PDMS. 2 nd master. Substrate: anything smooth and flat silicon is the easy choice. Surface preparation: -bake adsorbed water vapor out
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PDMS PDMS 1st master 3rd substrate active channel control channel PDMS 2nd master
PDMS 2nd master Substrate: anything smooth and flat silicon is the easy choice Surface preparation: -bake adsorbed water vapor out -clean: remove particles -adhesion promotion: HMDS
Adhesion promotion HMDS More hydrophobic surface, Better adhesion with resist (which is organic polymer)
Resist processing Resist dispensing Acceleration Final spinning 5000 rpm (a few milliliters) (resist expelled) (evaporation/partial drying)
Resist processing Spin Bake (Align) Expose (Post exposure bake) Development Hard bake
PDMS processing Pre-polymer and curing agent 10:1 ratio Mixing bubble free Casting Curing, e.g. 65oC, 2 h; or 40oC 10 h
PDMS properties TgTdegr CTE Ther UV-transparency conduc 0C oCppm/oC W/K.m PMMA 100 200 70 0.2 opaque PC 150 230 65 0.2 >350 nm PDMS -130 400 300 0.15 >240 nm SU-8 240 340 100 0.2 >350 nm Polyimid400 620 3-50 0.2 opaque Parylene 150 290 35 0.1 >300 nm Teflon 130 330 100 0.1 opaque PDMS Young’s modulus 10 MPa very elastic, peels off easily
Release Release criteria: -no retrograde angles -smooth surfaces -low surface energy -no interfacial reactions
Masters • photolithography of SU-8 • photolithography and silicon etching • photolithography and metal electroplating • discharge machining • laser machining • mechanical milling • natural objects
Masters (2) Why not silicon master ? Why not Teflon release layer ?
PDMS 1st master Tg = glass transition temperature Above Tg polymer flows hemispherical shape
PDMS 3rd substrate Thin PDMS What is thin ? 10-50 µm Spin coating Applicable to viscous polymers Typical thickness: 1-100 µm Casting: 100 µm to mm’s
PDMS 3rd substrate PDMS bonding Self-adhesive bonding ? Need strong bond for a valve application. Oxygen plasma activation Reactive OH-groups on surface permanent bonding
Valve array Todd Thorsen, Sebastian J. Maerkl, Stephen R. Quake, Science 2002, Vol 298