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6.151 Design and Fabrication of Piezoresistive Microcantilevers. 18 May 1999 Brian Hubert, Angie Nishimoto, Mark Ottensmeyer, David Robinson and Brian Romo,. Outline. Objectives Organization Design of Cantilevers and Process Flow Testing and Results Conclusions. Objectives.
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6.151 Design and Fabrication of Piezoresistive Microcantilevers 18 May 1999 Brian Hubert, Angie Nishimoto, Mark Ottensmeyer, David Robinson and Brian Romo,
Outline • Objectives • Organization • Design of Cantilevers and Process Flow • Testing and Results • Conclusions
Objectives • The creation of high performance, piezoresistive microcantilevers for use in AFM and chemical detection systems • Development of process flow • Electrical and Mechanical characterization of device performance
Organization • Five students • Motivation for taking 6.151 • Divided into two groups: piezoresistor processing and PI/DRIE processing • Advisors: • Profs. Martin Schmidt, Leslie Kolodziejski (MTL) • Prof. Scott Manalis (Media Lab) • Instructor Chi Hoang, MTL Staff
Process Flow • Starting material: lightly doped SOI wafer • Piezoresistor implant mask • Cantilever definition mask
Process Flow • Passivant oxide mask • Piezoresistor implant mask • Polyimide protective layer and deep etch mask
Process Flow • Released cantilevers
Results • Mechanical • resonant frequency: 44.5 kHz • differential mass measurements
Results • Electrical • highly inconsistent test wafer measurements • resistors from 2 to 18 k • leaky diodes • implantation issues
Results • System: results from device wafer • AFM tip deflections, Wheatstone bridge • Undeflected resistance: 9 to 12 k • Gage Factor: > 68 (max. expected = 100)
Comments & Conclusions • Process flow modifications • better doping • metal before cantilever definition • DRIE tuning: footing/undercutting • alignment marks • Working piezoresistive microcantilevers! • Reasonable gage factor • excellent yield: “ >99% ”