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Concentration Variability of Halocarbons over an Electronics Industrial Park and

Concentration Variability of Halocarbons over an Electronics Industrial Park and Its Implication in Compliance with t he Montreal Protocol. ENVIRONMENTAL SCIENCE & TECHNOLOGY VOL. 35, NO. 16, 2001. Speaker: Ann. Ozone hole. http://www.esrl.noaa.gov/news/2007/ozone2007.html.

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Concentration Variability of Halocarbons over an Electronics Industrial Park and

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  1. Concentration Variability of Halocarbons over an Electronics Industrial Park and Its Implication in Compliance with the Montreal Protocol ENVIRONMENTAL SCIENCE & TECHNOLOGY VOL. 35, NO. 16, 2001 Speaker: Ann

  2. Ozone hole http://www.esrl.noaa.gov/news/2007/ozone2007.html

  3. Target compounds CFC-113、CCl4、CFC-12、CFC-11、CH3CCl3、 C2HCl3、C2Cl4 RCl + hv→ R + Cl Cl + O3→ ClO + O2 ClO + O → Cl + O2 Net reaction :O3+O → 2O2

  4. Sampling locations

  5. Instruments ☆ In-situ (2000) - Park : GC/ ECD ☆ Flask (2000) - Park : GC / MS ☆ Flask (1997) - Park : GC / ECD ☆ Flask (1997) - Coastal: GC / ECD ☆ Column :DB-1(60 m X 0.32 mm X 1.0 μm )

  6. In-situ chromatogram

  7. Concentration distribution In July 2000 (Flask) In March 1997 (Flask)

  8. Concentration variability

  9. Relative concentration variation

  10. Relative concentration variation

  11. Relative concentration variation

  12. Concentration v.s wind direction 0 ° 270 ° 90 ° 180 °

  13. Concentration v.s wind direction CCl4 CFC-113 CFC-11 CFC-12

  14. Concentration vs. wind direction CH3CCl3 C2Cl4 C2HCl3

  15. Conclusions ☆ Thein-situ measurement method can be more precisely recorded andbetter rationalized than the flask measurement method. ☆The minor emissions of CFC-113 and CCl4 detected by the in-situ method combining with wind data suggest that good compliance with the Montreal Protocol.

  16. Thank you for your attention

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