JEOL JBX-9300FS Electron Beam Lithography System Training
JEOL JBX-9300FS Electron Beam Lithography System Training. Course Outline. Explain hardware column, lenses, amplifiers field, chip, subfield shot pitch, beam diameter D = (I * t)/A Calibration AE & BE marks INITAE, INITBE, PDEFBE, SUBDEFBE, DISTBE HEIMAP Substrate various cassettes
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