Nanoimprint Lithography

Sep 14, 2014

30 likes | 385 Views

Nanoimprint Lithography. Silicon Mold PMMA Metal Substrate.

Share Presentation

Embed Code

Link

pmma
nanoimprint lithography
metal substrate
silicon mold

elinor

Download Presentation

Nanoimprint Lithography

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

Nanoimprint Lithography Silicon Mold PMMA Metal Substrate

Lithography

Lithography. Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation source such as light.

999 views • 37 slides

Repeatability and control in nanoimprint lithography

Repeatability and control in nanoimprint lithography. Sarah Felix 4/14/08 EE C235 - Nanoscale Fabrication. Objective. Look at how lithography system components influence performance of nanoimprint lithography (NIL). Process overview. Parameters and cycle time. Translation speed, v t

407 views • 13 slides

Lithography

Paulo Moreira. Technology. 2. Lithography. Basic sequenceThe surface to be patterned is:spin-coated with photoresistthe photoresist is dehydrated in an oven (photo resist: light-sensitive organic polymer)The photoresist is exposed to ultra violet light:For a positive photoresist exposed areas become soluble and non exposed areas remain hardThe soluble photoresist is chemically removed (development).The patterned photoresist will now serve as an etching mask for the SiO2 .

456 views • 5 slides

NFF MA6 Nanoimprint Upgrade

Workshop for NFF Nanoimprint System. NFF MA6 Nanoimprint Upgrade . Workshop for NFF Nanoimprint System. Outline. Nanoimprint Lithography (NIL) Upgrade Parts. Workshop for NFF Nanoimprint System. Nanoimprint Lithography (NIL).

436 views • 16 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL, reverse NIL, inking. NIL of bulk resist (polymer sheet, pellets).

998 views • 52 slides

SEM lithography

SEM lithography. Mason Overby 2/23/09. Outline. SEM (Scanning Electron Microscope) basics Why use SEM lithography Basic process for nanolithography How does this apply to carbon? Few extras…. SEM basics. Filament electron source Accelerated by variable potential “scanned”

576 views • 17 slides

Nanoimprint lithography (NIL)

1.45k views • 54 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. Alignment. NIL into metals. NIL systems (air press, roller, roll-to-roll, EFAN…) NIL applications. ECE 730: Fabrication in the nanoscale : principles, technology and applications

1.01k views • 58 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. ECE 730: Fabrication in the nanoscale : principles, technology and applications Instructor: Bo Cui, ECE, University of Waterloo; http://ece.uwaterloo.ca/~bcui/

1.07k views • 41 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). UV-curable NIL. Resists for UV-NIL. Mold fabrication for thermal and UV-NIL. Alignment. NIL into metals. NIL systems (air press, roller, roll-to-roll, EFAN…). ECE 730: Fabrication in the nanoscale : principles, technology and applications

3.13k views • 50 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL, reverse NIL, NIL of bulk resist (polymer sheet, pellets). UV-curing NIL. Resists for UV-NIL.

690 views • 39 slides

Defect Analysis in Thermal Nanoimprint Lithography

Defect Analysis in Thermal Nanoimprint Lithography. Yoshihiko Hirai, Satoshi Yoshida, and Nobuyuki Takagi Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures , Vol. 21, No. 6, pp. 2765–2770, November 2003 Presentation by Chris Hannemann. Overview.

352 views • 10 slides

Direct Nanoimprint Lithography

Yongshik Park EE235 04/14/08. Direct Nanoimprint Lithography. Nanoimprint Lithography (1994). Prof. Stephen Y. Chou. Imprint mold with 10nm diameter pillars. 10nm diameter holes imprinted in PMMA. 10nm diameter metal dots fabricated by NIL.

548 views • 14 slides

First Nano-wire FinFETs via UV-based Nanoimprint Lithography

First Nano-wire FinFETs via UV-based Nanoimprint Lithography. Nanowire fin field effect transistors via UV-based nanoimprint lithography * A. Fuchs,a M. Bender, U. Plachetka, L. Kock, T. Wahlbrink, H. D. B. Gottlob, J. K. Efavi,

485 views • 11 slides

NANO-Lithography

NANO-Lithography. Name : DEKONG ZENG EE235 Spring 2007. Recent progress in high resolution lithography Daniel Bratton, Da Yang, Junyan Dai and Christopher K. Ober* Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA. All material gathered from Public Domain.

594 views • 19 slides

Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography

Fabrication of photonic crystal structures on light emitting diodes by nanoimprint lithography. Authors: Sang Hoon Kim, Ki-Dong Lee, Ja-Yeon Kim, Min-Ki Kwon and Seong-Ju Park Presented by Darsen Lu (3/19/2007). Outline. Introduction Some background Information Mold Fabrication

817 views • 19 slides

Lithography

Lithography. By: Ryan Levin. Lithography Overview. Optical Lithography has been the main method for manufacturing. Optical Lithography is expected to continue as such until 45nm through techniques such as; OAI, PSM, and OPC. The 32nm node is viewed as beyond the scope of optical lithography.

512 views • 7 slides

Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography

NANO LETTERS 2006 Vol. 6, No. 3 351 - 354. Circuit Fabrication at 17 nm Half-Pitch by Nanoimprint Lithography.

293 views • 17 slides

Lithography

Lithography. Topics: Wafer exposure systems Photoresists Manufacturing Methods & Equipment Measurement Methods. Projected Lithography Requirements. Projection systems. Proximity Printing : Mask/wafer separated 5-25 m m Separation results in poor resolution

657 views • 27 slides

Air bubble formation and dissolution in dispensing nanoimprint lithography

Air bubble formation and dissolution in dispensing nanoimprint lithography. Xiaogan Liang, Hua Tan, Zengli Fu, and Stephen Y Chou. Nanotechnology, 17 Jan 2007. William Casper-Ortiz Mechanical Engineering Dept. UC Berkeley. Significance.

352 views • 11 slides

Quantum Lithography

Quantum Lithography. Robert Boyd, Sean Bentley * , Hye-Jeong Chang, Heedeuk Shin, Malcolm O’Sullivan-Hale and Kam Wai Chan Institute of Optics, University of Rochester, Rochester, NY * Department of Physics, Adelphi University, Garden City, NY Girish Agarwal

312 views • 27 slides

Lithography

684 views • 7 slides

More Related