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ARGUS 54 - Optical Sputter Coater Vacuum Process Technology LLC Dr. Keqi Zhang & Ralph Faber May 1, 2013. Motivations:
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ARGUS 54 - Optical Sputter Coater Vacuum Process Technology LLC Dr. Keqi Zhang & Ralph Faber May 1, 2013
Motivations: • Offer a deposition tool for optical coating industry that combines the advantages of both e-beam evaporation (large area, fast rate) and IBS deposition (stable process, higher film quality). Approaches: • Plasma enhanced pulsed DC magnetron sputtering • Basic concept is based on a 54-inch chamber with a planetary system that contains six 16-inch planets.
Key Performances / Features: • Sputtered deposition of multilayers of metals, and metal oxides • Large area, fast deposition rate • 6 x 16-inch planets • Rate: Ta2O5/Nb2O5: 5Å/s, SiO2: 6Å/s • Uniformity: typical ±1.0%, goal: ±0.5% • Thickness control • Standard: quartz crystal, time power • Optional: through-the-planet optical monitoring (Single Wavelength or Broad Band)
Optical Sputter Coater Pulsed DC ion / plasma enhanced Materials: Ta2O5/SiO2 Very stable and repeatable process: Deposition rate: 5.0Å/s --- Ta2O5 6.0Å/s --- SiO2
Uniformity of a LP filter across a 16-inch planet (spectrally measured)
Uniformity of a LP filter across a 16-inch planet (Normalized)
Coating examples : 72-layer SP (Ta2O5/SiO2 , 5.7µm)Backside uncoated
Coating examples : 37-layer GFF (Ta2O5/SiO2, 3.8µm)Backside uncoated
Coating examples: IR cut filter Argus’54 Competitor’s
Coating examples: 80-layer WB(Ta2O5/SiO2, 7.1µm)Backside uncoated
Coating examples: 52-layer Longpass(Ta2O5/SiO2, 3.0µm)Backside uncoated
Current status: • Optical properties: excellent • Absorption: low • Scattering: low • Mechanical properties • Dense, durable film • Film stress: 230 – 300MPa, compressive • Film uniformity • Less Than ±0.5% on a 16-inch planet • High throughput; unparalleled process stability