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Fundamentals of Semiconductor Physics

Fall 2006. Fundamentals of Semiconductor Physics. 万 歆 Z hejiang I nstitute of M odern P hysics xinwan@zimp.zju.edu.cn http://zimp.zju.edu.cn/~xinwan/. Transistor technology evokes new physics.

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Fundamentals of Semiconductor Physics

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  1. Fall 2006 Fundamentals of Semiconductor Physics 万 歆 Zhejiang Institute of Modern Physics xinwan@zimp.zju.edu.cn http://zimp.zju.edu.cn/~xinwan/

  2. Transistor technology evokes new physics The objective of producing useful devices has strongly influenced the choice of the research projects with which I have been associated. It is frequently said that having a more-or-less specific practical goal in mind will degrade the quality of research.I do not believe that this is necessarily the case and to make my point in this lecture I have chosen my examples of the new physics of semiconductors from research projects which were very definitely motivated by practical considerations. -- William B Shockley Nobel Lecture, December 11, 1956

  3. Chapter 3. Junctions & Contacts 3.1 Metal-semiconductor contacts 3.2 p-n junctions 3.3 Heterojunctions Total 9 hours.

  4. Chapter 3. Junctions & Contacts 3.1 Metal-semiconductor contacts • A review of the principles • Idealized metal-semiconductor junctions • Current-Voltage characteristics • Ohmic contacts 3.2 p-n junctions 3.3 Heterojunctions

  5. Separated M-S Systems

  6. Bring M-S into Contact At thermal equilibrium the Fermi levels is constant throughout a system.

  7. Inhomogeneously Doped SC

  8. Ideal Density-of-States

  9. Energy levels

  10. Charge Transfer  Equilibrium Electrons depleted Assume band structures not changed near the surface. Real situation: Surface states

  11. No Hope to Solve Analytically • Poisson’s equation • the electron density, the hole density and the donor and acceptor densities. To solve the equation, we have to express the electron and hole density, n and p, as a function of the potential, f

  12. Depletion Approximation • For the idealized n-type semiconductor, hole density neglected • Electron density n << Nd, thus depleted, from the interface to x = xd • Beyond xd, n = Nd • Negative charge right at the metal surface

  13. Field, Potential and Charge (Gauss’ law)

  14. Applied Bias • Up to this point, we have been considering thermal equilibrium conditions at the metal-semiconductor junction. • Now, we study the case of an applied voltage; i.e., a nonequilibrium condition. • Electrons transferring from metal to semiconductor see a barrier.

  15. Applied Bias • To the first order, the barrier height is independent of bias because no voltage can be sustained across the metal. • Bias changes the curvature of the semiconductor bands, modifying the potential drop from fi.

  16. Junction Charge & Capacitor

  17. Small-Signal Capacitance

  18. Variable Doping

  19. “Semiconductor Profiler”

  20. Schottky Barrier Lowering • We now explore the statement that the barrier to electron flow from metal to semiconductor is “to first order” unchanged by bias. • Approximations: • Free electron theory • Metal as plane conducting sheet • Semiconductor: effective mass, relative permittivity • Root: Metal plane = image charge of opposite sign

  21. Schottky Barrier Lowering

  22. I-V Characteristics w/out Math • At equilibrium, rate at which electrons cross the barrier into the semiconductor is balanced by rate at which electrons cross the barrier into the metal. (flow = counter flow). • When a bias is applied, the potential drop within the semiconductor is changed and we can expect the flux of electrons from the semiconductor toward the metal to be modified. • The flux of electrons from the metalto the semiconductor is not affected. • The difference is the net current.

  23. I-V Characteristics • The current of electrons from the semiconductor to the metal is proportional to the density of electrons at the boundary. • In equilibrium,

  24. I-V Characteristics • When a bias is applied to the junction, • Now, • Therefore, the ideal diode equation reads

  25. Comments • The ideal diode equation arises when a barrier to electron flow affects the thermal flux of carriers asymmetrically. • The essence of the ideal diode equation predicts a saturation current J0 for negative Va and a very large steeply rising current when Va is positive. • J0 in the above ideal case is independent of the applied bias. More careful analysis will modify this slightly.

  26. More Detailed Analysis • Schottky: Integrating the equations for carrier diffusion and drift across the depletion region near the contact. Assumes that the dimensions of the space-charge region are sufficiently large (a few electron mean-free path) so that the use of a diffusion constant and a mobility value are meaningful (small field, no drift velocity saturation). • Bethe: Based on carrier emission from the metal. Valid even when these abovementioned constraints are not met.

  27. Diffusion and Drift Currents

  28. Trick for Integration

  29. Schottky Barrier

  30. Mott Barrier

  31. Comments • One important implicit assumption is that the system is in quasi-equilibrium, i.e., almost at thermal equilibrium even though currents are flowing. • Electron density at the interface when the bias is applied. • Using Einstein relation to relate drift and diffusion current. • The ultimate test: Agreements between measurements and predictions. • Derivation not valid when Va ~ fi (no barrier). A fraction of the voltage is dropped across the resistance of the semiconductor. The forward voltage across the junction is reduced.

  32. Nonrectifying (Ohmic) Contacts • Definition: The contact itself offers negligible resistance to current flow when compared to the bulk. • The voltage dropped across the ohmic contacts is negligible compared to voltage drops elsewhere in the device. • No power is dissipated in the contacts. • Ohmic contacts can be described as being in equilibrium even in when currents are flowing. • All free-carrier densities at an Ohmic contact are unchanged by current flow. The densities remain at their thermal-equilibrium values.

  33. Tunneling Contacts • By heavily doping the semiconductor, so that the barrier width is very small and tunneling through the barrier can take place.

  34. Schottky Ohmic Contacts

  35. Surface Effects

  36. Pinning of Fermi Energy • To account for the surface effects, the metal-semiconductor contact is treated as if it contained an intermediate region sandwiched between the two crystals. • For a large density of surface states, the Fermi energy is said to be pinned by the high density of states.

  37. Schottky Diodes

  38. Chapter 3. Junctions & Contacts 3.1 Metal-semiconductor contacts 3.2p-n junctions 3.3 Heterojunctions

  39. Metal-Semiconductor Contacts • A system of electrons is characterized by a constant Fermi level at thermal equilibrium. • Systems that are not in thermal equilibrium approach equilibrium as electrons are transferred from regions with a higher Fermi level to regions with a lower Fermi level. • The transferred charge causes the buildup of barriers against further flow, and the potential drop across these barriers increases to a value that just equalizes the Fermi levels.  Similar phenomena in a single crystal with non-uniform doping.

  40. Graded Impurity Distributions • We assume initially the majority carrier density equals the dopant density everywhere. We ask how equilibrium is approached. • A gradient in the mobile carrier density  diffusion of carriers. • Carrier diffusion leaves dopant ions behind. • Separation of charge  field opposing the diffusion flow. • Equilibrium is reached when diffusion is balanced by the field.

  41. The separation of the Fermi level from the conduction-band edge (or intrinsic Fermi level) represents the potential energy of an electron. Potential

  42. Field Using mass-action law,

  43. Density vs Potential Barrier

  44. Poisson’s Equation Cannot be solved in the general case!

  45. (i) Small Gradient Case Quasi-neutrality approx.:

  46. (ii) p-n Junction • Depletion approximation↔ quasi-neutral approximation

  47. Depletion of Mobile Charge

  48. Potential Barrier

  49. Two Idealized Cases • Linearly graded junction: a continuous gradient in dopant between n-type and p-type regions. • Step junction (abrupt junction): a constant n-type dopant density changes abruptly to a constant p-type dopant density – for example, formed by epitaxial deposition

  50. Step Junctions

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