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fMLF

A. B. 200. fMLF. WKYMVM. 100. fMLF. 100 nM. WKYMVM. 100 nM. 80. 150. Maximum O 2 - production (% control). 60. O 2 - production (Mcpm). 100. 40. 20 nM. 20 nM. 50. 20. 0. 0. 0. 0. 6. 2. 4. 2. 4. 1. 10. 100. 1000. Time (min). Time (min).

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fMLF

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  1. A B 200 fMLF WKYMVM 100 fMLF 100 nM WKYMVM 100 nM 80 150 Maximum O2- production (% control) 60 O2- production (Mcpm) 100 40 20 nM 20 nM 50 20 0 0 0 0 6 2 4 2 4 1 10 100 1000 Time (min) Time (min) Agonist concentration (nM) D C 80 120 fMLF WKYMVM fMLF WKYMVM PMA 80 60 40 90 20 0 0 2 4 40 O2- production (% control ) O2- production (Mcpm) Control PTX (1.5h) PTX (2h) Control PTX (1.5h) PTX (2h) 60 30 0 0 0 2 4 0 2 4 6 0.01 0.1 1 5 Time (min) Time (min) PBP10 concentration (M ) Control (2h) PTX (2h)

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