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#4 (Oct. 22) Photolithgraphy

#4 (Oct. 22) Photolithgraphy. -What is photolithgraphy? -Thin-film patterning using phtolithgraphy -Applications of photolithgraphy -Trends in minimum pattern sizes. What Is Photolithgraphy?. Photo + Lithograph Technologies to replicate patterns on a photomask to

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#4 (Oct. 22) Photolithgraphy

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  1. #4 (Oct. 22) Photolithgraphy -What is photolithgraphy? -Thin-film patterning using phtolithgraphy -Applications of photolithgraphy -Trends in minimum pattern sizes

  2. What Is Photolithgraphy? Photo + Lithograph Technologies to replicate patterns on a photomask to substrates or thin films on the substrates by using photo-chemical reaction photoresist Thin film on a substrate Photomask

  3. What Is Photoresit A material that changes its solubility to developer by irradiation of light (ultraviolet or X ray) and electron beam Changes: (1) Non-soluble to solvable (positive-type photoresist) (2) Soluble to non-soluble (negative-type photoresist)

  4. Composition of Photoresist Sensitizer

  5. Change of Sensitizer by UV Irradiation Non-soluble Soluble

  6. Purposes and Features of Photolithography Purposes -Fabrication of electron devices such as LSIs -Fabrication of micromachines -Packaging of LSIs and micromachines Features -Minimum size of 1 mm or less is achievable -Batch process -Pattern repetition

  7. Photomask Fabrication (1) Chromium thin film deposition and photoresist deposition Photoresist （1 mm） Chromium thin film （50 nm) a b a b Fused-quartz substrate (1 mm)

  8. Photomask Fabrication (2) Electron beam a b a b

  9. Photomask Fabrication (3) Development a b a b

  10. Photomask Fabrication (4) Etching of chromium thin film a b a b

  11. Photomask Fabrication (5) Photoresisit removal a b a b

  12. Phtolithography of Al Thin Film (1) Silicon substrate a b a b

  13. Phtolithography of Al Thin Film (2) SiO2thin film(1 mm) a b a b

  14. Phtolithography of Al Thin Film (3) Al thin film（1 mm) a b a b

  15. Phtolithography of Al Thin Film (4) Photoresist a b a b Followed by pre-baking at 120 ℃

  16. Phtolithography of Al Thin Film (5) Mercury lamp Photomask a b a b

  17. Emission Spectrum of Mercury Lamp Intensity (relative) Wavelength (nm)

  18. Phtolithography of Al Thin Film (6) Development a b a b Followed by post-baking at 120~180 ℃

  19. Phtolithography of Al Thin Film (7) Al thin film etching a b a b

  20. Phtolithography of Al Thin Film (8) Photoresist removal a b a b

  21. Lift-Off of Al Thin Film (1) Photoresist a b a b

  22. Lift-Off of Al Thin Film (2) Mercury lamp Photomask a b a b (2)

  23. Lift-Off of Al Thin Film (3) Development a b a b

  24. Lift-Off of Al Thin Film (4) a b a b

  25. Lift-Off of Al Thin Film (5) a b a b (5)

  26. Lift-Off of Al Thin Film (6) a b a b

  27. Wiring Using Al Thin Films Contact holes

  28. Cross-Section of CMOS LSI

  29. Pattern Size Reduction by Stepper Stepper Contact aligner Pattern generator Stepper Reticle Photomask Wafer Design data Projection aligner Electron beam scanner

  30. Stepper http://www.tochigi-nikon.co.jp/business/stepper/

  31. Trends in Minimum Pattern Size http://public.itrs.net/

  32. Inside Clean Room (MIT)

  33. Homework: Read This Article by 11/4 There's Plenty of Room at the Bottom An Invitation to Enter a New Field of Physics by Richard P. Feynman http://www.zyvex.com/nanotech/feynman.html

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