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Micromachined Planar Inductors on Silicon Wafers for MEMS Application. George Burdell III School of Electrical and Computer Engineering Georgia Institute of Technology Atlanta, GA 30332-0250. Paper Summarized.
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Micromachined Planar Inductors on Silicon Wafers for MEMS Application George Burdell III School of Electrical and Computer Engineering Georgia Institute of Technology Atlanta, GA 30332-0250
Paper Summarized • C. H. Ahn, and M. G. Allen, “Micromachined planar inductors on silicon wafers for MEMS applications,” IEEE Trans. Industrial Electron., vol. 45, pp. 866-876, Dec. 1998.
Application of Micromachined Inductors • Magnetic microactuators • Magnetic microsensors • Integrated switched DC/DC converters
Desired Characteristics of Micromachined Inductors • High Q-factor ( high L, low R ) • High current-carrying capability • High magnetic saturation • Closed magnetic circuit • Low production cost • Ease of fabrication
Geometries of Micromachined Inductors with Ni/Fe Core Spiral type Solenoid type Toroidal-meander type * The Pictures are taken from the paper summarized
Photomicrograph of Fabricated Inductors Spiral type Toroidal-meander type Solenoid type * The Pictures are taken from the paper summarized
Electrical Performance Comparison of Fabricated Inductors Equivalent circuit of the inductors Electrical parameters of the fabricated inductors * The picture and the table are taken from the paper summarized
Conclusion • Design and fabrication of three different types of integrated micromachined inductors with Ni/Fe cores • Comparison of electrical parameters