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UV2litho

Project objectives. Key objectives:Provide feed-back to resist and mask suppliers to guide their development for 157nmProvide metrology solutions for the 70nm nodeProvide resist solutions for 157nm production scannerDemonstrate 157nm resist solutions on the critical layers for the 70nm node. Ac

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UV2litho

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    1. UV2litho Project Presentation

    2. Project objectives Key objectives: Provide feed-back to resist and mask suppliers to guide their development for 157nm Provide metrology solutions for the 70nm node Provide resist solutions for 157nm production scanner Demonstrate 157nm resist solutions on the critical layers for the 70nm node

    3. Methodology Methodology : The objectives will be met by establishing a 157nm infrastrucure at IMEC based on a 0.75 NA scanner interfaced to a TEL ACT8 track and supported by metrology equipment. Project structure

    4. Consortium and resources IMEC (Belgium) ASM Lithography (The Netherlands) Philips Innovations Technology Solutions (PITS) (Belgium) ST Microelectronics SA (France) Infineon Technologies AG (Germany) Laboratoire des Technologies de la Microélectronique CNRS (CNRS-LTM) (France) ST Microelectronics S.r.l. (Italy)

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