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2006/7 ITRS Emerging Research Materials July 12, 2006

2006/7 ITRS Emerging Research Materials July 12, 2006. Michael Garner – Intel Daniel Herr – SRC. 2006 ERM Participants. Chuck Black IBM Herb Bennett NIST George Bourianoff Intel John Carruthers Port. St. Univ. U-In Chung Samsung M. Garner Intel, Co-Chair Rudi Hendel AMAT

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2006/7 ITRS Emerging Research Materials July 12, 2006

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  1. 2006/7 ITRS Emerging Research Materials July 12, 2006 Michael Garner – Intel Daniel Herr –SRC

  2. 2006 ERM Participants Chuck Black IBM Herb Bennett NIST George Bourianoff Intel John Carruthers Port. St. Univ. U-In Chung Samsung M. Garner Intel, Co-Chair Rudi Hendel AMAT Dan Herr SRC, Co-Chair Jim Hutchby SRC Louis Lome IDA Cons. Dave Roberts Air Products Sadasivan Shankar Intel John Henry Scott NIST Shinichi Tagaki U of Tokyo Kang Wang UCLA Rainer Waser Aacken U. In Kyeong Yoo Samsung Victor Zhirnov SRC Expect the Team to Grow Through 2006

  3. Si Technology: Material Complexity Increasing Exponentially Composition & Nanostructure Source: Intel

  4. Update ERD Materials Section (2007) ERD/ERM: Strongly Correlated Electron State Materials Meeting November 15, 2006 Develop ERM Chapter (2007) Goal: Identify critical ERM technical and timing requirements Consolidated Materials Research Requirements for: University Researchers (Chemist, Materials Scientist, etc) Chemical & Material Suppliers Corporate Researchers Emerging Research Materials

  5. Strongly Correlated Electron State Materials Workshop Tokura Tokura • Materials exhibit complex phase relationships • Structure, Strain, Spin, Charge, Orbital Ordering • Goal: Determine whether complex phases and coupled dynamic and static properties have any potential to enable alternate state logic devices Can these materials enable new device functions?

  6. Identify ERM performance requirements with ITRS TWGs E-Workshops to Review Materials Status vs. Needs Identify Research Needs Synthesis Metrology Modeling ESH ERM TWG Plan

  7. Cross Cutting Materials designed to address specific roadmap issues Carbon Nanotubes & Nanoparticles Macromolecules Directed Self Assembly Strongly Correlated Electron State Materials Hetero-structures & interfaces Environment Safety & Health ERM Proposed Scope Monthly e-Workshops

  8. Carbon nanotubes of interest for multiple applications Carbon Nanotube FET Shenogin et. al., JAP, p8136, 2004 1D Material Potential Applications Devices Interconnects Source Intel Thermal: CNT Interface Resistance 3.3X10-8Km2/W Meindl, et. al., IEEE EDL, 26, p 84, 2005

  9. Potential Application of Directed Self Assembly for Lithography and Interconnects Directed Self Assembled Materials Low K ILD Lithography Di-block Copolymer self assembly on patterned Molecular monolayer: Goal reduce LER P. Nealey, U. Wisc. Source: J. Brinker, UNM/Sandia National Labs

  10. Update the ERD/ERM 2007 Strongly Correlated Electron State Materials Workshop November, 2006 ERM Chapter 2007 Organize ERM Team Align Scope with TWGs Needs Establish Emerging Research Material Requirements Review ERM Status vs. Needs Identify Research, Synthesis, Metrology, Modeling & Timing Needs Summary 2006 Plans

  11. Back-up

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