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Lecture 8.0. Silicon Crystal Growth. Silicon Mfg. - old. Produce Silicon metal bar Zone Refining – n times To get purity Cut off impure end Use pieces to fill crystallization apparatus Grow Mono-Crystal of large size. Zone Refining. 0=x-Ut, k=C S /C L.
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Lecture 8.0 Silicon Crystal Growth
Silicon Mfg. - old • Produce Silicon metal bar • Zone Refining – n times • To get purity • Cut off impure end • Use pieces to fill crystallization apparatus • Grow Mono-Crystal of large size
Zone Refining 0=x-Ut, k=CS/CL Co=solute concentration in melt or of solid on first pass Co=0x+L Cs(x)dx - ox-L kCL(x)dx
Silicon Mfg. - new • Produce ultra pure Silicon cylinder • Use pieces to fill crystallization apparatus • Grow Mono-Crystal of large size
Melt is maintained with a given impurity concentration Melting Point is decreased Solid produced has a given impurity concentation Add Dopants to Silicon Grown
Ultra-pure Silicon Production • Si + 3HClSiHCl3 +H2 • fluidized bed reactor at 500 to 700K • Condense chlorosilane, SiHCl3 • Distillation of liquid SiHCl3 • SiHCl3+H2Si + 3HCl at 1400K • Si vapor Deposits on Si mandrel in a purged fed batch reactor heated to 700K • Results Large diameter Si with impurities at 10 ppt or 14-9’s pure
Czochralski Crystal Growth Apparatus • Figure 4. Today's Czochralski growth furnace, or crystal puller, is a far more sophisticated apparatus than that built by Gordon Teal nearly 50 years ago. It is however fundamentally identical. A crystal is pulled from a feedstock of molten material by slowly withdrawing it from the melt. Czochralski pullers often possess provisions for adding to the melt during a single pull so that crystals larger than what can be obtained in a single charge of the crucible may be produced. Today crystals of a 12-inch diameter are possible, and the industry will spend billions to adopt this new size in the coming years. This figure was taken directly from the Mitsubishi Semiconductor • website: http://www.egg.orjp/MSIL/ english/index-e.html!
Crystal Growth Steps • Induce Supersaturation • Sub cooled melt • S=exp[THf/(RT2)dT] • Nucleation • Growth at different rates on each Crystal Face • Results in crystal with a particular Crystal Habit or shape
Nucleation • Free Energy • GTOT=GvV + A • Critical Size • R*=2AVm/(3vRgT lnS) • Nucleation Rate • J=(2D/d5)exp[-G(R*)/(RgT)] • D=diffusion coefficient • d= molecular diameter
Surface Nucleation • Surface energy, , is replaced by cos , where is the contact angle between phases • Geometric factors changed • Units #/(cm2sec) • Surface Nucleation • Limits growth of flat crystal surfaces
Crystal Growth • Boundary Layer Diffusion • Surface Diffusion • Edge Diffusion • Kink Site Adsorption • Loss of Coordination shell at each step
Crystal Growth Rate Limiting Steps • Boundary Layer Diffusion • Surface Diffusion • Surface Nucleation • Mono • Poly • Screw Disslocation • Edge Diffusion • Kink Site Adsorption • Loss of Coordination shell
Fluxes • Boundary Layer • Surface • Edge
Mass Transfer to Rotating Crystal • Local BL-MT Flux • J[mole/(cm2s)] = 0.62 D2/3(Co-Ceq) n-1/6w1/2 • J[mole/(cm2s)] = 0.62 D2/3 Ceq(S-1) n-1/6w1/2 • Franklin, T.C. Nodimele, R., Adenniyi, W.K. and Hunt, D., J. Electrochemical Soc. 135,1944-47(1988). • Uniform, not a function of radius!! • Crystal Growth Rate due to BL-MT as Rate Determining Step
Heat Transfer to Rotating Crystal • Local BL-HT Flux • J[mole/(cm2s)] = h(Teq-T)/Hf • J[mole/(cm2s)] • = 0.62 k -1/3 n-1/6w1/2 (Teq-T)/Hf • Franklin, T.C. Nodimele, R., Adenniyi, W.K. and Hunt, D., J. Electrochemical Soc. 135,1944-47(1988). • Uniform, not a function of radius!! • Crystal Growth Rate due to BL-HT as Rate Determining Step
Crystal Habit • Equilibrium Shape • h1/1=h2/2=h3/3 • Kinetic Shape • h1=G1(S)*t • h2=G2 (S)* t • h3=G3 (S)* t
Crystal Faces • Flat Face • Stepped Face • Kinked Face • Diffusion Distances to Kink sites are shorter on K &S Faces