1 / 11

FABRICATION OF MAGNETRON TARGETS BY SHOCK COMPRESSION А . Е . Rozen, S. G. Usatyi, D. V. Karakozov, N. А . Lyubomirova

X EPNM. FABRICATION OF MAGNETRON TARGETS BY SHOCK COMPRESSION А . Е . Rozen, S. G. Usatyi, D. V. Karakozov, N. А . Lyubomirova. Penza State University. 40, Krasnaya Str, Penza, 440026, Russia e - mail : metal @ pnzgu . ru. X EPNM. Urgency job.

nyx
Download Presentation

FABRICATION OF MAGNETRON TARGETS BY SHOCK COMPRESSION А . Е . Rozen, S. G. Usatyi, D. V. Karakozov, N. А . Lyubomirova

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. X EPNM FABRICATION OF MAGNETRON TARGETS BY SHOCK COMPRESSIONА. Е. Rozen, S. G. Usatyi, D. V. Karakozov, N. А. Lyubomirova Penza State University 40, Krasnaya Str, Penza, 440026, Russia e-mail: metal@pnzgu.ru

  2. X EPNM Urgency job World earnings of the technologies allowing combining abilities of capacitive and resistive touch displays will double by 2012 and will account for 4,4 billion US dollars. The given product is manufactured using targets of magnetron type of evaporation. Rather strict requirements are set for the targets: - high chemical purity and structural uniformity throughout the target; - high density for reducing gas content in pores; - high stability in the conditions of temperature changes and considerable temperature differences over the thickness.

  3. X EPNM Producing the target one should pay attention to: - the density; - the grain size; - the uniformity; - the target fastening to the base; - the technology of producing the resistive compact. There are two most widely-spread ways of producing the targets: - powder metallurgy; - and melting with the following casting.

  4. X EPNM Objective of the work The objective of the work is development of the technology of shock-wave processing of the powder resistive material for the targets of the magnetron type of evaporation. As the standard test material to carry out the research the silicon resistive material powder has been chosen. Its chemical composition: - Cr = 52,5 … 55,5 %; - Si = 38,0 … 43,0 %; - Co= 4,5 … 7,5 %.

  5. X EPNM Explosive pressing arrangement

  6. X EPNM Explosive compression 1 - electrical detonator; 2 – explosive charge; 3 - piston plate; 4 - conservation container; 5 - press powder; 6 – metalplate , 7 – rings; 8 – target foot; 9 – plate foot; 10 – ground.

  7. X EPNM Magnetron targetsby shock compression

  8. X EPNM UVN 71-P3 plant

  9. X EPNM Comparative data

  10. X EPNM Conclusions - it was shown that traditional technologies of producing articles from resistive materials do not provide achieving the performance criteria built in the nature of the matter; - it was developed the pattern of explosive loading; - it was received materials with high electrophysicalcharacteristics.

  11. X EPNM Thank you for attention 40, Krasnaya Str, Penza, 440026, Russia e-mail: metal@pnzgu.ru

More Related