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DiPamat Di rect Pa tterning M aterials. Etch / Plating Resist. What is resist. A photo resist is a chemical product that, under the influence of UV light, changes its chemical nature. Resist without UV: is washed away during resist development. Resist with UV:
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DiPamatDirect Patterning Materials Etch / Plating Resist
What is resist A photo resist is a chemical product that, under the influence of UV light, changes its chemical nature. Resist without UV: is washed away during resist development Resist with UV: is NOT washed away during resist development protects the copper in the etch batch is stripped away after etching Remark: 1 Etch resist: print & etch of inner layers 2 Plating resist: print, plate & etch of outer layers Eric Janssens May 2013
What is resist • Liquid photo resist (20%) • Curtain, roller- or spray coated • Thickness: 5 - 20µm • Pro: high resolution • Contra: dust inclusions and chemical sensitivity • Dry photo resist (80%) • Cold, hot or wet laminated • Thickness: 25 - 75µm • Pro: high yield and good tenting • Contra: line width Tenting: Via’s must be tented to avoid resist getting in the via Eric Janssens May 2013
Traditional resist printing • Workflow: • Design • Image and develop film, check • Coat, laminate resist • Image resist • If laminated: peel cover layer • Develop resist • Etch • Strip • Working with resist is: • A time consuming process step • Expensive • Fixed data • Ecological unfriendly Eric Janssens May 2013
Inkjet resist printing • Principle: • apply etch / plating resist • directly on the panel • using a set of Inkjet nozzles mounted on a XY table • ie without the use of a phototool or screen • Workflow: • Design • Print (with pin curing) • Curing (thermal and/or UV) • Etch • Strip Eric Janssens May 2013
Inkjet resit printing • Advantages: • Reduce cost • no phototool, less production steps • shorter production cycle, higher yields • Registration panel per panel / distortion compensation • front-to-back • outer layer to inner layer • Design changes & variable data per board • Fast (no set up) • Ecology Eric Janssens May 2013
Quid May 2013 • R&D project is in progress • Jetability and etch resistance: OK • Stripability: concepts are tested • Planning • One ER fieldtest in operation by end 2013 • Proliferation of ER in 2014 • Concept study PR Eric Janssens May 2013
Quid May 2013 Eric Janssens May 2013
Quid May 2013 Eric Janssens May 2013
Quid May 2013 Eric Janssens May 2013
Competition: Dow (Rohm and Haas) www.dowelectronicmaterials.com Phase shift ink Eric Janssens May 2013
Competition: MacDermid www.macdermid.com Eric Janssens May 2013
Competition: MuTracx www.mutracx.com • Spin-off from OCE Technologies (Canon) • Announces Lunaris: print system and etch resist for IL • Phase shift inkl • Uses Predict • Fieldtest summer 2010 in EU • Commercially available by mid 2011 Eric Janssens May 2013
Competition: MuTracx Eric Janssens May 2013
System supplier: MuTracx lunaris animation.avi Eric Janssens May 2013
Conclusion Inform your customers and prospects on our plans Gather as much information as possible Don't forget film Eric Janssens May 2013