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Dept. of Electrical Engineering, Korea Univ. Dae Yeon Lee

The New Single-silicon TFTs Structure for Kink-current Suppression with Symmetric Dual-Gate by Three Split Floating N+ Zones. Supervised by Man Young Sung (Korea Univ.). Dept. of Electrical Engineering, Korea Univ. Dae Yeon Lee. Contents. Introduction Background Proposal

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Dept. of Electrical Engineering, Korea Univ. Dae Yeon Lee

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  1. The New Single-silicon TFTs Structure for Kink-current Suppression with Symmetric Dual-Gate by Three Split Floating N+ Zones Supervised by Man Young Sung (Korea Univ.) Dept. of Electrical Engineering, Korea Univ. Dae Yeon Lee

  2. Contents Introduction Background Proposal Simulation & Results Conclusion

  3. Introduction • The Conventional Dual-Gate TFT • The Conventional Single-Gate TFT * Low On-current * Low Electric Field at the Channel/Drain Junction * Stable I-V Characteristic by Kink-Effect Suppression * High On-current * High Electric Field at the Channel/Drain Junction * Kink-Effect Premature Breakdown ! High On-Current Reduction of Kink-Effect + Goal is the Mixing of The Merit the each two TFTs 1. Kink-Effect Suppression 2. Improved On-Current

  4. Back Ground • Lowering the Electric Field by having Dual-Gate Structure Lowering the Impact Ionization at the Channel/Drain Junction Lowering the Generated Holes flowed to Source/Channel Junction Defense PBT action Parasitic Bipolar Transistor Floating N+ region recombines with the Holes Defense the lowering the Electrostatic Potential Barrier at the Source/Channel Junction by the Holes Proposed TFT structure achieved the reduction of the Kink-Effect so that stable Drain Current in the Saturation Region

  5. Proposal • The Dual-Gate TFT with Floating N+ channel - Off-Set Region Electrons inject at the Forward Bias Lowering the Electric Field Middle N+ region length < 1.51 um 3um Mo Mo Gate Gate 700nm 400nm 100nm Source Drain 1.65um 1.65um N+ N+ 400nm P P N+ P P N+ N+ 1um 0.7um 1um 2um 2um 110nm oxide 16um Total channel length=10um

  6. Design Rules

  7. Simulation & Results • Electrostatic Potential • Hole concentration • Electric Field • Drain Current – Drain Voltage Output Characteristics • Output Conductance

  8. Electrostatic Potential VG = 7 V, VD = 12 V Conventional Single-gate TFT Proposed Dual-gate TFT Conventional Dual-gate TFT • Lowering potential barrier at the source causes the kink effect. • Proposed TFT’s potential barrier enhanced the potential barrier 5 times than • Single - gate TFT and enhanced 18 % that of conventional dual-gate TFT.

  9. Electrostatic Potential (Zoom In) VG = 7 V, VD = 12 V Channel Source • The channel region starts from 4.3 um point • The Potential Barrier value for the each TFTs Value is 0.5 V, 2.3 V, 2.8 V at a 5 um • point which starts floating n+ region

  10. Hole Concentration VG = 7 V, VD = 12 V > 1017 Conventional Single-gate TFT Proposed Dual-gate TFT Conventional Dual-gate TFT • High Electric field at Drain Junction causes Impact Ionization so that holes flow to • the source junction through channel -> PBT action • Floating N+ regions recombine with holes so that hole concentration at the source • junction can be reduce.

  11. Hole Concentration (Zoom In) VG = 7 V, VD = 12 V Source Channel • The channel region starts from 4.3 um point • The Hole concentration value for the each TFTs Value is 1017 /cm3, 101 /cm3, • 10-1 /cm3 at a 5 umpoint which starts floating n+ region

  12. Electric Field VG = 7 V, VD = 12 V Conventional Single-gate TFT Proposed Dual-gate TFT Conventional Dual-gate TFT • High Electric field at Drain Junction causes kink effect. • The usual approach to reduce this effect is to limit the impact ionization • contribution decreasing the electric field at the drain junction.

  13. Electric Field(Zoom In) VG = 7 V, VD = 12 V Channel Drain • The channel region starts from 12.9 um point • The electric field value of each TFT is approximately 105 V, 2.8×102 V, and • 2.9×102 V.

  14. Drain Current – Drain Voltage Output Characteristics 1.611 mA 0.870 mA 0.522 mA VG = 7 V, VD = 12 V • The on-current of the proposed dual-gate TFT is 0.870 mA while that of the • conventional dual-gate TFT is 0.522 mA • This result shows a 67 % enhancement in on-current

  15. Drain Current – Drain Voltage Output Characteristics W/L = 2

  16. Drain Current – Drain Voltage Output Characteristics • The on-current of the proposed dual – gate TFT • at different gate voltage

  17. Output Conductance Characteristics VG = 7 V, VD = 12 V Kink starting point • Reduction of the Output conductance means the reduction of the kink effect • so that we can get a stable drain current in the saturation region. • The output conductance of the conventional single-gate increases about 8.3 V.

  18. Conclusion • Lowering the High electric Field at the Drain junction by • Dual – Gate TFT structure • Improved Electrostatic Potential • Reduction of the Hole concentration by the holes recombine with • the Floating N+ region in the channel region • On-Current is 0.870 mA in the saturation region while that of the • conventional dual – gate TFT is 0.522 mA at VG = 7 , VD = 12 V • A stable Output Conductance is accomplished by the reduction • of the kink effect

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