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E-beam Strategies Motivation Stage movement strategies EBL writing strategies

E-beam Strategies Motivation Stage movement strategies EBL writing strategies. Motivation. different writing strategies required. Applications of EBL mask fabrication (e.g. chromium on glass) direct write (rapid prototyping) nano devices in R&D …. Recommended Literature:

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E-beam Strategies Motivation Stage movement strategies EBL writing strategies

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  1. E-beam Strategies • Motivation • Stage movement strategies • EBL writing strategies

  2. Motivation different writing strategies required Applications of EBL • mask fabrication (e.g. chromium on glass) • direct write (rapid prototyping) • nano devices in R&D • …. Recommended Literature: SPIE HANDBOOK OF MICROLITHOGRAPHY, MICROMACHINING AND MICROFABRICATION Volume 1: Microlithography, Chapter 2.1

  3. Stage Movement Strategies stationary stage moving stage versus stripes fields "write-on-the-fly“

  4. EBL Writing Strategies round (gaussian) beam shaped beam versus vector scan raster scan versus

  5. EBL Writing Strategies

  6. 1st Strategy (Raith) gaussian beam, vector scan, fixed stage write field chip wafer shapes beam path

  7. 1st Strategy (Raith) gaussian beam, vector scan, fixed stage meander mode line mode

  8. 1st Strategy (Raith) gaussian beam, vector scan, fixed stage + fast writing of sparse patterns (unwritten areas are skipped) + easy dose variation from shape to shape – settling time and hysteresis have to be calibrated – overhead time caused by increased stage settling time Applications: nano lithography, R&D, …

  9. 2nd Strategy (Etec) gaussian beam, raster scan, moving stage stage motion beam motion (e.g. used by MEBES (Etec Systems Inc.))

  10. 2nd Strategy (Etec) gaussian beam, raster scan, moving stage + very simple + very repeatable calibration possible – sparse patterns take as long as dense patterns – difficult to adjust dose during writing Applications: mask making, R&D, …

  11. 3rd Strategy (Leica) shaped beam, moving stage electron beam first shaping aperture second shaping aperture beam deflectors two fields wafer

  12. 3rd Strategy (Leica) shaped beam, moving stage +  10 x faster than equivalent gaussian beam machines – extremely complex electron optical column – complicated calibration routines – resolution and focus varies with shape size Applications: mask making, advanced chip development Extension: Cell projection (one of the square apertures is replaced by a more complex shape such as a DRAM cell.

  13. Summary: 3 Strategies

  14. Summary: Strategy used by Raith vector scan meander mode stationary stage vector scan line mode fields gaussian beam Applications: Nano device fabrication, R&D

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