'Atomic layer thickness control' presentation slideshows

Adam Kueltzo Thornton Fractional North High School July 30 th , 2009 University of Illinois at Chicago Advanced Material

Atomic Layer Deposited HfTiOx composite film On Si (100) with Al 2 O 3 as buffer layer . Adam Kueltzo Thornton Fractional North High School July 30 th , 2009 University of Illinois at Chicago Advanced Materials Research Laboratory (AMReL) Mentors: Dr. G. Jursich and Dr. C.G. Takoudis

543 views • 21 slides