100+ Boron implant PowerPoint (PPT) Presentations, Boron implant PPTs

Boron implant - PowerPoint PPT Presentation

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Examples. Diffusion with oxidation. Boron predeposition at 1000 o C for 20 minutes Drive in a dry oxidizing environment for 2 hours at 1000 o C Background carrier concentration is 1E14 cm -3. Surface of wafer. After Photolith and Etching. Diffusion. Boron implant with Q = 9.22x10 14 cm -2

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Boron implant - PowerPoint PPT Presentation

Examples