'Ee235 class presentation' presentation slideshows

Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisot

Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process. by S. J. Kwon, Y. M. Jeong, and S. H. Jeong Gwangju Institute of Science and Technology (Korea)

346 views • 9 slides