'Resistant masks' presentation slideshows

University of Wisconsin-Madison NSEC: Templated Synthesis and Assembly at the Nanoscale

Etching Amount (nm). Etching Time (s). Thrust 1: Direct Patternable Organic-Inorganic Hybrid Block Copolymer Template T. Hirai, M. Leolukman , C.C. Liu, E. Han, Y.J. Kim, Y. Ishida, T. Hayakawa, M.-A. Kakimoto , P.F. Nealey , P. Gopalan. (a). (b). PMMA- b -PMAPOSS.

92 views • 1 slides