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Introduction and application. Light source and photomask, alignment. Photolithography systems.

Chapter 5 Lithography. Introduction and application. Light source and photomask, alignment. Photolithography systems. Resolution, depth of focus, modulation transfer function. Other lithography issues: none-flat wafer, standing wave... Photoresist.

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Unexposed resists - PowerPoint PPT Presentation

Introduction and application. Light source and photomask, alignment. Photolithography systems.