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Microstructured Vertically Aligned Carbon Nanotube Composites. Dr. Robert Davis & Group Brigham Young University Physics and Astronomy davis@byu.edu (presented by Prof. David Allred, BYU). Outline. Vertical aligned carbon nanotube (VACNT) growth Dense nanotube structures
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Microstructured Vertically Aligned Carbon Nanotube Composites Dr. Robert Davis & Group Brigham Young University Physics and Astronomy davis@byu.edu (presented by Prof. David Allred, BYU)
Outline Vertical aligned carbon nanotube (VACNT) growth Dense nanotube structures Filling in with Si by LPCVD Resistivity Crystallinity of filler material Density, Elastic Modulus Constraints/Engineering Design Rules
30 nm Al2O3 (Barrier Layer) Si VACNT growth details • Pattern Fe by lift-off • Heat to 750 °C in H2: Ar • Ar : H2 : C2H4 at 70 : 500 : 700 sccm 1-15 nm Fe
SEM - VACNT forest Can top surface and edge roughness be improved? 100X – 50 µm holes 4500X – 3 µm holes 30000X – edge
Light Photoresist 1-15 nm Fe 30 nm Al2O3 (Barrier Layer) Si VACNT growth process • Photolithography & lift-off Photoresist Photoresist
Dependence on Fe Thickness 15 nm 5.5 nm 2 nm < 1 nm Good repeatability Rate strongly dependant on thickness
2 nm Fe on Al2O3 • Small voids (< 200 nm across) • Sharp features (few stray tubes); Sidewall roughness < 200 nm • High growth rate ~50 µm/min
Nanotube “forest” growth Height: up to 1mm+ Feature size: a few microns Speed: 10-100µm/min Density:
Low density, weakly bound material As-grown forests are flimsy and tear off the surface at the slightest touch
Liquid Induced Densification Dried structure Submerged nanotube structures
Vapor Condensation Induced Densification -- Lines Longer exposure to vapor Shorter exposure to vapor
Surface forces dominates Unequal angles become equal angles. Final structure depends on initial structure surface forces Difficult to control what results!
AIST Japan group working on in-plane aligned CNT MEMS Yuhei Hayamizu, Takeo Yamada, Kohei Mizuno, Robert C. Davis, Don N. Futaba, Motoo Yumura, & Kenji Hata Nature Nanotechnology 3, 241 (2008).
VACNT Composite MEMS Process “floor layer”
A variety of materials? Filled with amorphous Si: Filled with amorphous C:
High aspect ratio structures in a variety of materials? FROM: Chemical Vapor Deposition, ed. Jong-Hee Park, ASM International (2001)
Properties: Resistivity Isolated nanotubes: Can exhibit ballistic conduction over distances of several microns Undoped poly-Si: ρ ~ 102Ω cm Si-coated nanotubes: ρ ~ ? Coat tubes with insulator Conductive MEMS made from insulating materials?
Properties: Resistivity R0 K1= 42.6 Ωm K2= 0.04 μm
Properties: Resistivity R0 ρforest ~ 4 Ω cm ρpoly-Si alone ~ 10000 Ω m
Properties: Resistivity R0 ρforest ~ 4 Ω-cm Approximately the same resistivity as previously reported for other CNT-composites
Microstructure: Poly-Si Between tubes, dark field
Properties: Poly-Si Alumina layer Iron Si Substrate Between tubes, dark field
Properties: Poly-Si Between tubes, dark field
Mechanical Characterization Filled forests are solid and well adhered (can withstand the scotch tape test)
Beam Bending Measurement of Elastic Modulus 1000um 20um 38um Eop = 120 GPa Reported bulk polySi modulus ~ 140-210 GPa, dependent on deposition conditions
Actuated device: thermomechanical in-plane microactuator (TIM)
Developing Engineering Design Rules • Height to width ratio for dimensional stability • Maximum feature width for filling of forest interior • Role of geometry LPCVD fill-factor
Researchers BYU Physics David Hutchison Brendan Turner Katherine Hurd Matthew Carter Nick Morrill Dr. Richard Vanfleet BYU Mechanical Engineering • Quentin Aten • Dr. Brian Jensen • Dr. Larry Howell Nanocarbon Research Center AIST Japan Dr. Kenji Hata Funded by a Brigham Young University Environment for Undergraduate Mentoring Grant Partial funding provided by Moxtek Inc.
High Aspect Ratio Micromachining Deep Reactive Ion Etching (Si) MARIO Process (Titanium) “High-aspect-ratio bulk micromachining of titanium,” Aimi et al., Nature Mat. 3, 103-5 (2004) “Vertical Mirrors Fabricated by DRIE for Fiber-Optic Switching Applications,” C. Marx et al., J. MEMS 6, 277, (1997) LIGA process (photoresist) SU-8 / C-MEMS (photoresist / carbon) “C-MEMS for the Manufacture of 3D Microbatteries,” Wang et al., Electrochem. Solid-State Lett. 7 (11) A435-8 (2004) “Micromechanisms,” H. Guckel, Phil. Trans. R. Soc. Lond. 353, 355-66 (1995)
VACNT Growth Studies Objective: Dimensional Control • Stable uniform features • Smooth straight sidewalls and top surface • Minimum void dimension Variables: • Barrier layer material • Fe catalyst thickness
Barrier layer study: • Al2O3 – 30 nm • Native - SiO2 • Thermally grown SiO2 – 30 nm • Titanium – 30 nm Early growth 2 sec. of C2H4 flow
TEM analysis of barrier layers Both oxides form barrier to Fe diffusion, Al2O3 results in smallest particles
Quantitative particle size analysis of barrier layers Alumina has far more of the smallest particles.
Effects of Al2O3 barrier layer • Reduce Fe loss through diffusion • Controls Fe particle size during anneal • Reduces CNT diameter • Increases CNT density and growth rate • Indicates reduces Fe surface diffusion