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Applications of Photovoltaic Technologies

Applications of Photovoltaic Technologies. 單 ( 多 ) 晶矽太陽能電池的製程技術. 以規則性以及週期性進行三度空間分布地排列而成的鑽石結構. Si 的結晶型態. 非晶矽的、多晶矽的、以及單晶矽的三種不同的結晶型態. Solar PV Chain. There are several steps from raw material to power systems. Silica. MG-Si. assembly. Surface treatment. Purification. Casting. 矽的製造過程.

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Applications of Photovoltaic Technologies

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  1. Applications of Photovoltaic Technologies

  2. 單(多)晶矽太陽能電池的製程技術 以規則性以及週期性進行三度空間分布地排列而成的鑽石結構

  3. Si的結晶型態 非晶矽的、多晶矽的、以及單晶矽的三種不同的結晶型態

  4. Solar PV Chain • There are several steps from raw material to power systems Silica MG-Si assembly Surface treatment Purification Casting

  5. 矽的製造過程 矽 (Quartz) 冶金級矽 (MG-Si) 乙西爾製程 西門子製程 多晶矽原料 (Poly-Si) CZ Casting Ribbon FZ 多晶矽 (mc-Si) 單晶矽 (sc-Si)

  6. 冶金級矽(MG-Si)的製程-1 冶金級矽材料的製程流程 - 碳熱還原製程法的示意圖

  7. 碳熱還原製程(Carbothermic Reduction Process) 冶金級矽(MG-Si)的製程-2 主反應 SiO2(s) 2C(s) Si(l) 2CO(g) CO2(g) 副反應 Si(l) 1/2O2(g) SiO(g) SiO(g) 1/2O2 SiO2(s)

  8. 碳熱還原製程(Carbothermic Reduction Process) 冶金級矽(MG-Si)的製程-3 在內層高溫熱區：反應溫度在1,900~2,100C 2SiO2(l)  SiC(s) 3SiO(g)  CO(g) SiO (g)  SiC(s) 2Si(l)  CO(g) 在外層低溫冷區：反應溫度小於1900C SiO(g)  2C SiC(s)  CO(g) 2SiO(g) Si(l)  SiO2(s)

  9. 冶金級矽(MG-Si) • Si的純量約為98.5% • 不存物如下所列

  10. 鑄型壓碎製程(Casting Scratch Process) 多晶矽原料(Poly-Si)的製程示意圖 西門子(Simen)製程法的製作流程示意圖

  11. 多晶矽原料(Poly-Si)的製程-1 精煉製程 (Refining Process) 其主要的反應式如下： 3(SiO2)  4Al 3Si(l)  2(Al2O3) SiO2 2Ca Si(l)  2(CaO) SiO2 2Mg Si(l)  2(MgO) Si(l)  O2  (SiO2) 第五章　單晶矽及多晶矽太陽能電池　P 152

  12. 鑄型壓碎製程(Casting Scratch Process) 多晶矽原料(Poly-Si)的製程-2 第一階段化學反應式 Si(s)3HClSiHCl3H2 Si(s)  4HCl  SiCl4 2H2 SiCl4 H2 SiHCl3 HCl 3SiCl4 2H2Si  4SiHCl3 2SiHCl3 SiCl4 Si  2HCl

  13. 鑄型壓碎製程(Casting Scratch Process) 多晶矽原料(Poly-Si)的製程-3 第二階段化學反應式 2SiHCl3SiH2Cl2 SiCl4 SiH2Cl2Si  2HCl HSiCl3  H2Si  3HCl HSiCl3 HCl SiCl4 H2

  14. 多晶矽原料(Poly-Si)的製程示意圖 乙西爾製程法的製作流程示意圖

  15. Silica • Metallic Silica • Refining • Tricholoro Silicane • Deposition • Multi-crystalline Si • Polycrystalline Si Addition of B or P • Melting • Single crystalline Si • Multi-crystalline Si wafer • Slicing • Single crystalline • Si Wafer Solar cell – Sand to Si

  16. 單晶矽的製程技術 柴可夫斯基長晶法 (a) 以及浮動帶熔融長晶法 (b)

  17. Czochralski (CZ) process: (CZ Si wafer)

  18. Production of mc-Si Si melt Heat exchanger Direction solidification Poly Si mc-Si ingot

  19. Dicing of mc-Si 切塊(Dicing) mc-Si block 線鋸(Wire sawing) mc-Si wafer

  20. SSP growth Si ribbons (wafers) Reducing material consumption by: 1.Producing thinner wafers 2.Reducing kerf loss EFG growth Methods of producing Si ribbons 1.The edge defined film fed growth process (EFG) 2.Ribbon growth on substrate (RGS) 3.Silicon sheets from powder (SSP) Si sheet from powder • Wafer thickenss < 250 m • Very low kerf loss • Efficiency over 14%

  21. 結晶矽太陽電池製程步驟例(I) 1. 清洗蝕刻 2. 磷擴散 3. 鍍抗反射層 P-type wafer

  22. 結晶矽太陽電池製程步驟例(II) 4. 網印 5. 燒結

  23. 台灣太陽光電廠商供應情形

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