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Progress Report GLAD design principles ALD applied in PEC. Reporter: Zhibin Luo Aug 22 nd 2013. GLAD design principles. Ta 、 Ti 、 Au 、 Ni , etc. metal or oxide thin films. Substrate.
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Progress Report GLAD design principles ALD applied in PEC Reporter: Zhibin Luo Aug 22nd 2013
GLAD design principles Ta、Ti、Au、Ni,etc. metalor oxide thin films Substrate Glancing atomic deposition (Reactive ballistic deposition) can grow hierarchical structures,such as nanowires and Nanorobs Vapor Deposition Source UHV
Mean Free Path Average distance between collisions for a gas molecule, could then be taken as the length of the path divided by the number of collisions Average velocity Volume of interaction Number of molecules per unit volume (Avogadro's number and the ideal gas law)
Mean Free Path Calculation D=290pm D≈600pm Dim=290pm 25℃ 10-8 torr 0.8265×104m 10-6 torr 0.8265×102m Dim=600pm 25℃ 10-8 torr 1.9309×103m 10-6 torr1.9309×101m Dim=600pm 25℃0.1m (lowest pressure) 1.9309×10-4torr ≈0.0258Pa J. Chem. Phys. 1963, 38, 2686
GLAD vacuum chamber B B A A
XYZ Rotary Manipulator A B 20° 10cm A B
ALD applied in PEC PEC-ALD What is PEC,why PEC,then the main principles for PEC What is ALD, the excellent features of ALD How to achieve the optimization of ALD thin film (important) Thin film vs hierarchical structure for the charge transportation and the electron/hole recombination
ALD applied in PEC And the application of ALD for PEC (Diagrammatic sketch) Thin films Multi-films Hierarchical coating ( large specific area,protecting layer,p-n fitting ) ALD-a facile method for mass production of catalyst for PEC
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