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Intoduction to VCSEL Device Simulation. Mou Zongying 07-06-2004. VCSEL Device Simulation. Introduction Basic concepts of Laser and semiconductor Physical model of VCSEL device Computing optical mode Numerical simulation Simulation results. Introdction. VCSEL:
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Intoduction to VCSEL Device Simulation Mou Zongying 07-06-2004
VCSEL Device Simulation • Introduction • Basic concepts of Laser and semiconductor • Physical model of VCSEL device • Computing optical mode • Numerical simulation • Simulation results
Introdction • VCSEL: vertical-cavity surface-emitting laser (semiconductor laser device, diode laser) • Telecomunications, Pumping source • Wave length : from infrared to visible etched mesa VCSEL 980nm Buried tunnel junction(BTJ) VCSEL 1300nm,1550nm • Material: ALGaAs(GaAs),InGaAsP(InP) • Simulators are needed to explore the design parameter for an optimum solution—low cost and short time for a design cycle
Basic Concepts of Laser • Laser
Requirements for Laser Action • Population inversion
Basic Concepts of Semiconductor • There are three types of conductors . Insulaters .Metals .Semicondctors
Energy Band for Solid • Metals . Overlapping energy bands or vary small gap . Electrons in conduction band • Semiconductors . Small energy gap <2ev . Some electrons in conduction band • Insulators . Large energy gap . No electrons in conduction band
Physical Model of VCSEL • Diode laser devices – history • Physical Model of VCSEl • Schematic of two kinds of VCSEL .Etched Mesa .BTJ • Maxwell´s equation • Laser device simulation
Diode Laser Devices • First working device appeared in 1962, at low temperature • Structure containing several semiconductor layers In 1969, at room temperature • After 1990, employed BTJ which causes a transverse waveguiding--stable transverse mode profile and small threshold current
Physical Model of VCSEL • Time Dependent Model (Finite Difference Time Domain) in 1995 • Stationay Model (Finite Difference Method) in 1995 • Microscopic VCSEL Model in 1998 • Isothermal Electric model in 1999 • Method of Lines in 2001
Etched Mesa VCSEL Schematic Etched Mesa VCSEL. DBR( distributed Bragg Resonator) Etched Mesa VCSEL(electron micrograph)
BTJ VCSEL • Schematic Buried Tunnel Junction VCSEL
Etched Mesa and BTJ VCSEL • Schematic cross section of two types of VCSEL
Maxwell´s Equation • Maxwell´s eq. and material eq.
Maxwell wave equation • for J=0
Maxwell wave equation Separate Eigenvalue problem Frequency Normalization
Laser Device Simulation Dielectric fuction Mechanism: . Direct interband absorption . Indirect interband absorption . Free carrier absorption . Interconduction band and intervalence band absorption
Laser Device Simulation Photon rate eq. Where Skis the photon number Rkis spontaneous emmission wk‘‘ is the net modal rate change
Computing Optical Mode • Open Cavity . Only the innerboundary Structure determines the optical mode . Outerboundary is an absorber (no backscattering)
Computing Optical Mode • Variational function
Computing Optical Mode • Rotation symmetric
Computing Optical Mode • Variational function for axi-symmetric case
Computing Optical Mode • Boundary condition
Numerical Simulation • Jacobi-Davidson QZ iteration method • Biconjugate gradient stabilished method (BiCGstab) is used to solve Jacobi correction equation and speed up the convergence • Software: LUM12 mode solver package
Simulation Result • The intensity of k(z) for the fundermental longitudinal VCSEL mode (Etched Mesa)
Simulation Result • Foundmental mode (BTJ)
Simulation Result • Higher mode (BTJ)
3D Numerical Simulation • Edge finite elements for solving 3D-Maxwell equation . Shape function are vectors . Unknows now along the edge . Natural elements for Maxwell´s equation . Restriction: domain has to be convex