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Single Stripe Pattern. Semiconductor Laser Laboratory. •. SiO. SiO 2 field. •. single open stripe. •. stripe width 25-150 µm. ILLINOIS. Dual Stripe Pattern. Semiconductor Laser Laboratory. •. open field. •. dual stripe. •.
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Single Stripe Pattern Semiconductor Laser Laboratory • SiO SiO2 field • single open stripe • stripe width 25-150 µm ILLINOIS
Dual Stripe Pattern Semiconductor Laser Laboratory • open field • dual stripe • stripe separation 2-5 µm • stripe width 2-25 µm • dimensions small with respect to a dif fusion length ILLINOIS