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The Basic Concept of the Photo filtration/Dispense

The Basic Concept of the Photo filtration/Dispense. 鼎岳科技公司 技術研討. 主講人 : 龍仁生. Content. The concept of liquid filtration What is an ideal dispense operation? Two-stage vs. single-stage Oring Conclusion. The key to filter in photo. The Filter pore size / Retention

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The Basic Concept of the Photo filtration/Dispense

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  1. The Basic Concept of the Photo filtration/Dispense 鼎岳科技公司 技術研討 主講人 : 龍仁生

  2. Content • The concept of liquid filtration • What is an ideal dispense operation? • Two-stage vs. single-stage • Oring • Conclusion

  3. The key to filter in photo • The Filter pore size / Retention • How much ? 0.1um, 0.2um… • Lower filtration rate, Higher retention • The Chemical Compatibility / Pre-wetting • PTFE • UPE • PP • Nylon • Cleanness • Low Hold Volume

  4. Filtration Retention Mechanisms: Capture by • Size Exclusion / Interception --- • Hard Particle--- Bridge/ Cake effect • Soft Gel • Micro-bubble Particles captured by sieving Particles captured by filter cake

  5. + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + Capture by Adhesion / Adsorption Retention Mechanisms: • Very small particles in liquids have a negative charge and can be captured by attraction to a positive charge in a filter

  6. Hydrophilic: • Wetting smoothly with, water.". • No pre-wetting • Hydrophobic: • Fear of water; • Tending not to combine with water. • Requires pre-wetting. Hydrophobic Vs Hydrophilic

  7. Hydrophobic Hydrophilic < 90? 90? > 90? No contact angle • Contact Angle is the measure of Wettability Hydrophobic Vs Hydrophilic i.e. Low contact angle = Hydrophobic High contact angle = Hydrophilic

  8. What is Dewetting and how can it impact a process? SC1 SC2 H2O2 NH4F Piranha

  9. Key for Photo resist filtration / Dispense • Consistent performance • Microbubble free dispense • Minimize Photoresist consumption • Maximize OEE (Overall Equipment Efficiency) • Minimize downtime • Reduce time to steady-state process • Improved equipment reliability (Utilization)

  10. General Problem with Coating Process • Contamination, High defects density • Soft particles • Hard particles • Bad Coating / Spin, poor uniformity, thickness drifted • Poor suckback • Insufficient photo-chemical • Inconsistent dispense rate • Operator error, using the wrong recipe • Back splash / Other hardware issues • Miss coating / High rework rate

  11. Particles Microbubble Photoresist Coating Defects

  12. Conventional Dispense Systems Filtration Rate Dispense Rate vent Pump Reservoir Filter Suck-back Valve Nozzle Photo-resist

  13. Single-Stage Dispense System Filtration rate = Dispense rate *High filtration rate -shorter filter life time -Poor contamination control *Dispense rate is affected by filter condition -Inaccurate dispense rate / volume Dispense rate Single-stage needs to raise the D.R.to keep at least 2.5cc/sec 3.0 2.5 Two-stage’s dispense rate can keep constant Time

  14. Single-Stage Dispense System Filtration rate = Dispense rate *High filtration rate -shorter filter life time -Poor contamination control *Dispense rate is affected by filter condition -Inaccurate dispense rate / volume

  15. Two-Stage Dispense Systems Purge and recalculation line Vent Dispense Rate Filtration Rate Nozzle Stepper motor- driven pump Pneumatic-driven pump Photo-resist

  16. Two-Stage Dispense Systems • Filtration , Dispense are separated • Longer filter life time • Reduce contamination (gels,micro-bubbles and • particles) • Provide precise and repeatable dispense of photo- • chemical • -Stable coating process • -Save photo-chemicals

  17. Pure Performance • Consistent Reduction in Particles • Two stage design allows for a slower filtration rate • Low filtration allows for lower filtration pressures • More efficient removal of gel slugs and hard particles • Filtration rate is independent of dispense rate

  18. Soft Gel Particles > 0.1 um Pleated PTFE 0.05um Hard Particles > 0.1um Wafergard 0.1um Impact LHVD Minichem 0.1um 0 1 2 3 4 5 Log Reduction Value (1 LRV = 90% Removal) Outstanding retention of gels, particle-on-wafer performance.

  19. EASY TO-USE

  20. Times Required to Change Dispense System Filters 25 20 15 Clean-up Time ( Minutes) Replace Filter Drain Housing 10 Prepare Area 5 0 GEN-2 WCDS-2 IntelliGen with Pump I Pump C Impact LHVD filter changeout in less than 1 minute

  21. 如何選擇O-RING • 物理 / 機械性質 --- 用途 • 熱性質 --- 操作環境溫度 • 物質抵抗 --- 操作環境接觸物質

  22. O-ring的選擇及應用基本指南

  23. 可得之優點----- 1.極佳的可靠性 2.較長之使用壽命 3.更高的安全性與可靠性 4.標準化與減少現貨存量的契機 5.最佳化之密封解決之道

  24. 結論 • UPE filter is the optimal choice • No need pre-wetting • Better retention • Limited Micro-bubble issue • Two-stage technology pumps show far superior performance than conventional one-stage pumps. • No need to adjust pump - Repeatable, reliable dispense • Easy changeout guarantees fewer mistakes • COST Saving • 選擇 O-ring 的重點 • 用途 • 溫度 • 接觸物質

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