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The Basic Concept of the Photo filtration/Dispense. 鼎岳科技公司 技術研討. 主講人 : 龍仁生. Content. The concept of liquid filtration What is an ideal dispense operation? Two-stage vs. single-stage Oring Conclusion. The key to filter in photo. The Filter pore size / Retention
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The Basic Concept of the Photo filtration/Dispense 鼎岳科技公司 技術研討 主講人 : 龍仁生
Content • The concept of liquid filtration • What is an ideal dispense operation? • Two-stage vs. single-stage • Oring • Conclusion
The key to filter in photo • The Filter pore size / Retention • How much ? 0.1um, 0.2um… • Lower filtration rate, Higher retention • The Chemical Compatibility / Pre-wetting • PTFE • UPE • PP • Nylon • Cleanness • Low Hold Volume
Filtration Retention Mechanisms: Capture by • Size Exclusion / Interception --- • Hard Particle--- Bridge/ Cake effect • Soft Gel • Micro-bubble Particles captured by sieving Particles captured by filter cake
+ + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + + Capture by Adhesion / Adsorption Retention Mechanisms: • Very small particles in liquids have a negative charge and can be captured by attraction to a positive charge in a filter
Hydrophilic: • Wetting smoothly with, water.". • No pre-wetting • Hydrophobic: • Fear of water; • Tending not to combine with water. • Requires pre-wetting. Hydrophobic Vs Hydrophilic
Hydrophobic Hydrophilic < 90? 90? > 90? No contact angle • Contact Angle is the measure of Wettability Hydrophobic Vs Hydrophilic i.e. Low contact angle = Hydrophobic High contact angle = Hydrophilic
What is Dewetting and how can it impact a process? SC1 SC2 H2O2 NH4F Piranha
Key for Photo resist filtration / Dispense • Consistent performance • Microbubble free dispense • Minimize Photoresist consumption • Maximize OEE (Overall Equipment Efficiency) • Minimize downtime • Reduce time to steady-state process • Improved equipment reliability (Utilization)
General Problem with Coating Process • Contamination, High defects density • Soft particles • Hard particles • Bad Coating / Spin, poor uniformity, thickness drifted • Poor suckback • Insufficient photo-chemical • Inconsistent dispense rate • Operator error, using the wrong recipe • Back splash / Other hardware issues • Miss coating / High rework rate
Particles Microbubble Photoresist Coating Defects
Conventional Dispense Systems Filtration Rate Dispense Rate vent Pump Reservoir Filter Suck-back Valve Nozzle Photo-resist
Single-Stage Dispense System Filtration rate = Dispense rate *High filtration rate -shorter filter life time -Poor contamination control *Dispense rate is affected by filter condition -Inaccurate dispense rate / volume Dispense rate Single-stage needs to raise the D.R.to keep at least 2.5cc/sec 3.0 2.5 Two-stage’s dispense rate can keep constant Time
Single-Stage Dispense System Filtration rate = Dispense rate *High filtration rate -shorter filter life time -Poor contamination control *Dispense rate is affected by filter condition -Inaccurate dispense rate / volume
Two-Stage Dispense Systems Purge and recalculation line Vent Dispense Rate Filtration Rate Nozzle Stepper motor- driven pump Pneumatic-driven pump Photo-resist
Two-Stage Dispense Systems • Filtration , Dispense are separated • Longer filter life time • Reduce contamination (gels,micro-bubbles and • particles) • Provide precise and repeatable dispense of photo- • chemical • -Stable coating process • -Save photo-chemicals
Pure Performance • Consistent Reduction in Particles • Two stage design allows for a slower filtration rate • Low filtration allows for lower filtration pressures • More efficient removal of gel slugs and hard particles • Filtration rate is independent of dispense rate
Soft Gel Particles > 0.1 um Pleated PTFE 0.05um Hard Particles > 0.1um Wafergard 0.1um Impact LHVD Minichem 0.1um 0 1 2 3 4 5 Log Reduction Value (1 LRV = 90% Removal) Outstanding retention of gels, particle-on-wafer performance.
EASY TO-USE
Times Required to Change Dispense System Filters 25 20 15 Clean-up Time ( Minutes) Replace Filter Drain Housing 10 Prepare Area 5 0 GEN-2 WCDS-2 IntelliGen with Pump I Pump C Impact LHVD filter changeout in less than 1 minute
如何選擇O-RING • 物理 / 機械性質 --- 用途 • 熱性質 --- 操作環境溫度 • 物質抵抗 --- 操作環境接觸物質
可得之優點----- 1.極佳的可靠性 2.較長之使用壽命 3.更高的安全性與可靠性 4.標準化與減少現貨存量的契機 5.最佳化之密封解決之道
結論 • UPE filter is the optimal choice • No need pre-wetting • Better retention • Limited Micro-bubble issue • Two-stage technology pumps show far superior performance than conventional one-stage pumps. • No need to adjust pump - Repeatable, reliable dispense • Easy changeout guarantees fewer mistakes • COST Saving • 選擇 O-ring 的重點 • 用途 • 溫度 • 接觸物質