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Molecular Beam Epitaxy Julia Vice 17 November 2004. What is MBE? and Why is it Important?. Ultra-High-Vacuum based technique for producing epitaxial structures with monolayer control Epitaxial = growing crystalline layers on a cyrstalline substrate
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What is MBE?andWhy is it Important? • Ultra-High-Vacuum based technique for producing epitaxial structures with monolayer control • Epitaxial = growing crystalline layers on a cyrstalline substrate • Used in the construction of quantum wells, dots and wires for use in lasers • Heterojunction Bipolar Transistors (HBTs) used in satellite communications • Electronic and Optoelectronic devices (light emitting diodes for laser printers, cd and dvd players)
The MBE System:How it Works • Vacuum System • Liquid N2 cryopanels • Effusion Cells • Substrate Manipulator
The Growth Process • 3 Phases: • Crystalline phase of the growing substrate • Disordered gas phase of the molecular beams • Near-surface transition layer between the crystalline and gas phases
Surface Processes • Desorption: re-evaporate • Form 2-dimensional clusters with other atoms • Adsorption: incorporate with the substrate • Migrate along a step to be incorporated at a kink • Key Controllable Factors: the surface and temperature of the subtrate and the molecular flow
Positive Aspects High material purity Good control of layer thickness and composition Easily monitored with RHEED (Reflective High Energy Electron Diffraction) Negative Aspects Low growth rate and substrate-size capability Low yields Advantages and Disadvantages of MBE
Sources • Anselm, Alex. “An Introduction to MBE Growth.” http://www.ece.utexas.edu/projects/ece/mrc/groups/street_mbe/mbechapter.html • Biasiol, G. and L. Sorba. “Molecular Beam Epitaxy: Principles and Applications.” 2001. http://tasc.infm.it/tasc/semic/hmmbe/school.pdf • “Physics of Thin Films.” 2004. http://www.uccs.edu/~tchriste/courses/PHYS549/549lectures/mbe.html • Veeco Learning Center. “Molecular Beam Epitaxy.” 2004. http://www.veeco.com/learning/learning_ molecularbeam.asp