1 / 21

Electronic transport properties of nano-scale Si films: an ab initio study

Electronic transport properties of nano-scale Si films: an ab initio study. Jesse Maassen , Youqi Ke, Ferdows Zahid and Hong Guo Department of Physics, McGill University, Montreal, Canada. Motivation (of transport through Si thin films).

abril
Download Presentation

Electronic transport properties of nano-scale Si films: an ab initio study

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. Electronic transport properties of nano-scale Si films: an ab initio study Jesse Maassen, Youqi Ke, Ferdows Zahid and Hong Guo Department of Physics, McGill University, Montreal, Canada

  2. Motivation(of transport through Si thin films) • As the thickness of a film decreases, the properties of the surface can dominate. University of Wisconsin-Madison

  3. Motivation(of transport through Si thin films) • The main motivation for our research was the experimental work by Pengpeng Zhang et al. with silicon-on-insulators. Nature 439, 703 (2006) Used STM to image 10 nm Si film on SiO2 Charge traps Surface states SiO2 University of Wisconsin-Madison SiO2 Si Vacuum

  4. Our goal First-principles study of electronic transport through Si(001) nano-scale films in a two-probe geometry Current Electrode Electrode University of Wisconsin-Madison

  5. Our goal First-principles study of electronic transport through Si(001) nano-scale films in a two-probe geometry Surface Current Thickness Electrode Electrode Length Doping level (lead or channel) Orientation University of Wisconsin-Madison

  6. Theoretical method • Density functional theory (DFT) combined with nonequilibrium Green’s functions (NEGF)1 • Two-probe geometry under finite bias DFT  HKS NEGF Simulation Box - + Device Left lead Right lead Buffer Buffer University of Wisconsin-Madison 1Jeremy Taylor, Hong Guo and Jian Wang, PRB 63, 245407 (2001).

  7. Theoretical method • DFT: Linear Muffin-Tin Orbital (LMTO) formalism2 • Large-scale problems (~1000 atoms) • Can treat disorder, impurities, dopants and surface roughness DFT  HKS NEGF 2Y. Ke, K. Xia and H. Guo,PRL 100, 166805 (2008); Y. Ke et al., PRB 79, 155406 (2009); F. Zahid et al., PRB 81, 045406 (2010). University of Wisconsin-Madison

  8. System under study (surface) • Hydrogenated surface vs. clean surface Clean [P(22)] H terminated [21:H] H Si (top:1) Si (top) Si (top:2) Si Si University of Wisconsin-Madison

  9. || dimers  dimers  dimers || dimers Results (bulk case) • Atomic structure & bandstructure H terminated [21:H] Clean [P(22)] || dimers  dimers  dimers || dimers • Large gap ~0.7 eV • (with local density approximation) • Small gap ~0.1 eV • (with local density approximation) University of Wisconsin-Madison

  10. || dimers  dimers  dimers || dimers Results (bulk case) • Atomic structure & bandstructure H terminated [21:H] Clean [P(22)] || dimers  dimers  dimers || dimers • Large gap ~0.7 eV • (with local density approximation) • Small gap ~0.1 eV • (with local density approximation) University of Wisconsin-Madison

  11. Results (bulk case) • Bandstructure : Direct vs. Indirect band gap • Up to ~17nm thick, the band gap of a SiNM is direct. • Need to calculate for thicker films. University of Wisconsin-Madison

  12. Band gap values with DFT Recent development solves the “band gap” problem associated with DFT calculations. University of Wisconsin-Madison

  13. n++ i n++ n++ n++ i Results (n++- i - n++ system) • Two-probe system • Channel : intrinsic Si • Leads : n++ doped Si • 21:H surface • Periodic  to transport T = 1.7 nm L = 3.8 nm L = 19.2 nm University of Wisconsin-Madison

  14. Results (n++- i - n++ system) • Potential profile (effect of length) • Max potential varies with length • Screening length > 10nm CB EF i n++ VB University of Wisconsin-Madison

  15. Results (n++- i - n++ system) • Potential profile (effect of doping) • Max potential increases with doping • Slope at interface greater with doping, i.e. better screening CB EF i VB n++ University of Wisconsin-Madison

  16. Results (n++- i - n++ system) • Potential profile (effect of doping) • Max potential increases with doping • Slope at interface greater with doping, i.e. better screening CB EF i VB n++ University of Wisconsin-Madison

  17. Results (n++- i - n++ system) • Conductance vs. k-points ( dimers) • Shows contribution from k-points  to transport • Transport occurs near  point. • Conductance drops very rapidly  TOP VIEW i n++ n++  University of Wisconsin-Madison

  18. i n++ n++  Results (n++- i - n++ system) • Conductance vs. k-points (|| dimers) TOP VIEW • Largest G near  point • Conductance drops rapidly, but slower than for transport  to dimers. University of Wisconsin-Madison

  19. Results (n++- i - n++ system) • Conductance vs. Length • Conductance has exponential dependence on length, i.e. transport = tunneling. • Large difference due to orientation. • Better transport in the direction of the dimer rows. University of Wisconsin-Madison

  20. Summary • Performed an ab initio study of charge transport through nano-scale Si thin films. • Expect to provide a more complete study on the influence of surface states shortly (H-passivated vs. clean)! • This method can potentially treat ~104 atoms (1800 atoms) & sizes ~10 nm (23.8 nm)! • This large-scale parameter-free modeling tool could be very useful for device and materials engineering(because of it’s proper treatment of chemical bonding at interfaces & effects of disorder). University of Wisconsin-Madison

  21. Thank you ! Questions? • Thanks to Prof. Wei Ji. • We gratefully acknowledge financial support from NSERC, FQRNT and CIFAR. • We thank RQCHP for access to their supercomputers. University of Wisconsin-Madison

More Related