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ETCHING. WAFER PROCESS FLOW. DEFINITION. Patterned Etch. Blanket Etch. HISTORY. Adopted in semiconductor industry for transistor & IC manufacture in 1950’s Before 1980, chemical solution were used to dissolve the materials not covered by PR to achieve the pattern transfer
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Patterned Etch Blanket Etch
HISTORY • Adopted in semiconductor industry for transistor & IC manufacture in 1950’s • Before 1980, chemical solution were used to dissolve the materials not covered by PR to achieve the pattern transfer • After 1980, replaced by dry (plasma) etch processes