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SiC influence on x-ray measurements of GaN films compared with photoluminescence and electrical data. E.A. Preble, Z. Reitmeier, S. Einfeldt, R.F. Davis North Carolina State University D.S. Katzer, H Dietrich Naval Research Labs Ulrich Schwartz Universität Regensburg February 12, 2002.
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SiC influence on x-ray measurements of GaN films compared with photoluminescence and electrical data E.A. Preble, Z. Reitmeier, S. Einfeldt, R.F. Davis North Carolina State University D.S. Katzer, H Dietrich Naval Research Labs Ulrich Schwartz Universität Regensburg February 12, 2002
Topics of discussion • Background • SiC wafer variability • SiC influence on GaN x-ray data • Wafer mapping as a solution to SiC influence • Extraction of reliable and repeatable x-ray data • Do x-ray map results correlate to PL and electrical results?
Typical SiC Wafers SiC FWHM
SiC/GaN FWHM Relationship GaN FWHM not influenced by SiC
Electrical results – Mobility vs Bulk Carrier Concentration
Why isn’t there a correlation? • XRD vs PL • X-ray measurements are bulk measurements • PL measurements are more localized • Correlations are not found because of scale difference • XRD vs Electrical Data • Both measurements are large area • Electrical results are not sensitive to domain tilting that is observed via XRD • This x-ray technique is not useful in prediction of electrical results