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Vertex detector for the KEK B factory upgrade. Toru Tsuboyama (KEK) 1 March 2008 Instr08 Novosibirsk . Introduction. CsI(Tl) 16 X 0. g pure CsI (endcap). Super Belle detector (LoI ‘04). m / K L detection 14/15 lyr. RPC+Fe. g tile scintillator. Tracking + dE/dx
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Vertex detector for the KEK B factory upgrade Toru Tsuboyama (KEK) 1 March 2008 Instr08 Novosibirsk
Introduction Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
CsI(Tl) 16X0 g pure CsI (endcap) Super Belle detector (LoI ‘04) m / KL detection 14/15 lyr. RPC+Fe g tile scintillator Tracking + dE/dx small cell + He/C2H6 • remove inner lyrs. use fast gas Si vtx. det. 4 lyr. DSSD g 2 pixel/striplet lyrs. + 4 lyr. DSSD Aerogel Cherenkov counter + TOF counter g “TOP” + RICH SC solenoid 1.5T New readout and computing systems Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Purpose of the Silicon Vertex Detector • SVD reconstructs two vertices of B decay. • B flight length ~ 200 mm. • The CP violation parameters are extracted from the distribution of distance between two vertices. 50 cm Belle SVD (4 layer) 20 cm J/ e e Dt KS Decay time difference Belle 2005 Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Super KEKB upgrade • The present KEKB has established the CP violation in the framework of the Standard Modelby using ~1 ab-1 of data. • Further investigations needs 10-50 ab-1 data. • Examination of the unitarity of the CKM matrix. • Measurement of the CP violation phase coming from Penguin diagrams. • Rare decay of the B mesons, charmed mesons and lepton flavor violation of t. • Any deviation from the standard model prediction suggests existence of new phenomena such as SUSY. • A Super B factory with L=1035-1036/cm2/sec is necessary. • Measurements by LHC and Super B factory experiments are complementary. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Current SVD Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Present SVD • Has been working since 2003 Autumn. • 4 layer DSSD ladders are read out with VA1TA chips. r = 2.0, 4.35, 7.0, 8.8 cm DSSDs Kapton flex circuit VA1TA Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Limitations of the present SVD • Readout ASIC: VA1TA • VA1 is an excellent ASIC designed for the KEK B factory. • Each event causes a dead time of about 30 msec. • 5 % dead time at 1.6 KHz trigger rate. • No problem at the current trigger rate of 500 Hz. • Hit occupancy of the innermost layer. • KEKB luminosity exceeded the design value. • So do the beam backgrounds entering to SVD. • At occupancy larger than 10 %, vertexing performance will be deteriorated significantly. • Shaping time of VA1TA, 0.8 msec, is longer than that of modern readout chips. • Four layer design. • Vertexing and self tracking is possible, though, the redundancy is minimum. Hit finding efficiency Occupancy in the first layer Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Our choice • 6 layer • For robust vertexing and tracking • Outer radius: 14 cm • High Ks reconstruction efficiency • Inner radius: 1.0 cm • For better vertex resolution. • Readout chip: APV25 • Reduction of occupancy from beam background. • Pipelined readout to reduce readout dead time. • Sensor of the innermost layer: • Normal DSSD Short-strip DSSD Pixel sensors • Depends on the available technology • Background is proportional to the sensitive area per channel. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Design philosophy of the upgrade SVD • Requirements from physics • To reconstruct vertices of two B mesons with ~100 mm resolution. • Reconstruct slow pions decaying from D*. • Lager radius in order to improve Ks reconstruction efficiency. • Better impact parameter resolution would result in better suppression of continuum events. • Constraints • Ready for physics at the Super KEK B factory commissioning • Immunity to the expected backgrounds from the accelerator. • Effects of material should be carefully evaluated and minimized. • Data acquisition • Should work efficiently at the luminosity goal of ~1036/cm2/sec. • Pipelined readout to minimize the dead time. • Negligible dead time at 10 kHz average trigger rate. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Detector configuration • 6 layers for robust tracking. • R=1.0 cm beam pipe. First layer R=1.3 cm. • Outermost layer: R=14 cm. • Acceptance of Ks is increase by 15 %. • Slanted sensors: Reduce sensor area and number of readout channels. Material is also saved. (cm) r =150mm 17° Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Readout system Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Readout with APV25 ASIC • Developed for CMS Silicon tracker. • Shaping time of the preamplifier: 50 nsec • Occupancy: 1/16 compared with VA1TA (800 nsec). • Operated with 40MHz clock • 192 stage pipeline (~4 µsec trigger latency) • Up to 32 readout queues • 128 ch analog multiplexing (3 µsec@40 MHz) • Dead time: negligible at expected trigger rate of 10 kHz Trigger • Noise= (246 + 36/pF) @50nsec Analog output 192 stageAnalog Pipeline (4 µsec) 128 channel Multiplexer (3 µsec) Shaper preamp Inverter Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Trigger Shaper Hit timing reconstruction • KEK B-Factory: 2 nsec bunch crossing • Built-in deconvolution filter (assuming the LHC 25 nsec bunch crossing) can not be used. • Hit time reconstruction • Read out 3, 6 … slices in the pipeline. • Extract the hit timing information from the wave form. • Proved in beam tests: Resolution ~ 2 nsec. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
APV25 readout system • Readout scheme suitable for Belle has been developed: Hybrid, Repeater system, FADC and DAQ. • Series of beam test has been done by in order to understand APV25 and to accumulate experiences. • Nov. 2007: The first experiment at the KEK new test beam line. • Demonstration of the new DSSD sensor, hybrid, repeater and FADC. • CM subtraction, cluster search and hit-time reconstruction done in FPGA is tried. • Poster presentation by Vienna HEPHY group in this conference. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Chip-on-sensor concept Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Chip-on-sensor readout • APV25 has a steeper noise slope than VA1TA • VA1TA Noise=(180+7.5/pF) e / APV25 Noise=(180+ 36/pF) e • Several DSSDs can be read out with one VA1TA hybrid. • In case of APV25, a DSSD should be readout by one hybrid. • Chip-on-sensor concept. • Mounting APV25 chips directly on sensors. • Increase of material due to not only chip itself but also support and cooling structure should affect the vertex performance. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Effects of material increase • In order to evaluate the performance of 6 layer SVD with APV25 chip-on-sensor design, intensive simulations have been done. Results have been reported in the workshop by A. Kibayashi. • Conclusions are • Chip on sensor readout for the innermost 2 layers would deteriorate the vertex performance. • Material increase in layer 3-6 does not reduce the vertex performance significantly. • High-multiplicity events (D+D-) is especially sensitive to material. • BK*g is special as only Ks can be used to estimate the B decay vertex. Efficiency improves thanks to layers 5 and 6. (T. Hara) Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
DSSD and pixel sensor R&D Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
DSSD • HPK stopped DSSD production. • Single sided sensors are too thick to be used in e+e- B factories. • New DSSD sources • Micron semiconductor, UK. • Experienced with Babar, LHCb, CDF, D0 …. • Can produce 300 mm-thick DSSDs from 6” diameter wafers Design flexibility. • Tata institute (Belle collaborator) • Produced single-sided sensors for the CMS experiment. • DSSD production is in progress with a foundry in Bangalore. • The sample will be available in April or May. • Kyumpook Univ. (Belle collaborator) • AC-coupled single-sided and DC coupled double-sided sensors are now under evaluation. • Design of an AC-coupled double-sided sensors are in preparation. Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Striplet option • The innermost layer suffers huge beam background. • Occupancy reduction by APV25 may not be sufficient • By inclining the strips by 45 degrees, strip area per readout channel can be reduced to almost 1 / 4, in expense of 4x readout channels. Striplet Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
7.9 mm 71 mm Striplet 2003 Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Monolithic pixel sensors • Pixel sensors are the solution to reduce the hit occupancy. • Monolithic pixel sensor should be used. • Hybrid sensors are too thick to be used in B factories. • Innermost layer can be replaced with pixel sensor later. • January 2007 submissions. • CAP (Hawaii) --- Monolithic Pixel Sensor project • Several iterations have been done. • CAP7 --- the concept is implemented in SOIPIX. • Binary readout. • SOIPIX (KEK, TIT et al.) • Continuous amplifier, time-over-threshold and simple digital pipeline is implemented. CAP7 Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
Summary Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
SVD construction schedule Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)
The SVD upgrade kick-off meeting • 20 Feb 2008, just before this BPAC. • Summary of the 3 to 4 years R&Ds. • Please visit http://kds.kek.jp/conferenceDisplay.py?confId=865 • Today’s presentation is a summary of this meeting. Overview 09:30 Schedule (T. Tsuboyama, KEK) 09:40 CDC inner radius (S. Uno, KEK) 09:45 Beam pipe (H. Yamamoto, Tohoku) 09:55 Overall design (T. Kawasaki, Niigata) 10:25 Structure / Ladder (O. Tajima, KEK) Electronics I 11:15 Pixel, ASIC ... (G. Varner, Hawaii) 11:45 Pixel-- SoI technology (H. Ishino, TIT) DSSD 13:00 HPK/Micron (T.Tsuboyama, KEK) 13:10 DSSD in Korea (H. Hyun, Kyungpook) Software 14:00 Overview (T. Hara, Osaka) 14:20 Demonstration for the Fallback option (Y.Kuroki, Osaka) 14:40 Simulation for Baseline option (A.Kibayashi, KEK) 15:00 Pixel Simulation (H. Hoedlmoser, Hawaii) 15:10 Tracking for SVD5.1 ? (K.Trabelsi, KEK) 15:30 Requirement for Alignment precision (T.Hara, Osaka) Performance study 16:00 Outer layer (I) radii (T.Hara for S.Shinomiya, Osaka) 16:10 Outer layer (II) S/N and readout ptch (, Niigata) 16:20 Material --- ASIC on DSSDs (T.Hara, Osaka) 16:30 Readiness of fsim6 (C. Schwanda, Vienna) Electronics II 17:00 APV25 and APV25 hybrid (C. Irmler, Vienna) 17:10 DAQ overview (M. Friedl / M. Pernicka, Vienna) 17:40 Activities in Cracow (H. Palka, INP Cracow) 18:00 Monitors (S. Stanic, Nova Gorica) 18:20 Diamond radiation monitor (S. Korpar, Ljubljana) Silicon Vertex Detector for the KEKB factory upgrade Toru Tsuboyama (KEK)