230 likes | 390 Views
Plasmafysica & Stralingstechnologie. Elementary Processes in Gasdischarges Plasma & Materials Processing Coherence & Quantum Technology Science and Technology of Nuclear Fusion. Plasma Physics and Radiation Technology. Plasma medium: common interest to the PPRT thrust area
E N D
Plasmafysica & Stralingstechnologie Elementary Processes in Gasdischarges Plasma & Materials Processing Coherence & Quantum Technology Science and Technology of Nuclear Fusion
Plasma Physics and Radiation Technology • Plasma medium: common interest to the PPRT thrust area • Same fundamental knowledge reservoir • Plasmas investigated vary in density and temperatures • Intrinsic nonequilibrium medium • Utilize fundamental knowledge in various applications • Very good example of applied science Experiments and modeling approach / Applied Physics
Plasma Physics and Radiation Technology • Physics and chemistry on short time and length scales • Use of high power lasers for in situ and real time plasma and surface diagnostics • Two groups: Research on plasma-surface interaction Plasma & Materials Processing (PMP) Research on homogeneous plasma processes Elementary Processes in Gasdischarges (EPG) / Applied Physics
Plasma Physics and Radiation Technology High phase space density plasmas Coherence & Quantum Technology DeBroglie wavelength: CQT Phase space density: Quantum Effects become important / Applied Physics
Plasma Physics and Radiation Technology • The track embraces research subjects such as: • the generation of plasma’s • plasma-surface interaction • (e.g. plasma deposition, plasma etching, etc.), • plasma-accelerators, novel ion and electron sources • laser cooling techniques and atomic optics An important characteristic of the master track is the fundamental approach of the themes as well as the research into new applications of this broad field of research. / Applied Physics
Plasma Physics and Radiation Technology General compulsorycourses: 3 courses with a total of 10 ECTS Compulsory and optional trackcourses: 17 ECTS consisting 2 compulsory courses of 8 ECTS in total and at least 11 ECTS of optional track courses; optional courses: each student has to choose a well-balanced set of courses to a total of at least 14 ECTS points (about 3-4 courses); external assignment project of 19 ECTS points (12 weeks) usually outside TU/e; graduation project of 60 ECTS points (1 year). / Applied Physics
Coherence & Quantum Technology (CQT) • Staff: • Prof. Jom Luiten • Prof. Ton van Leeuwen • Dr. Servaas Kokkelmans • Dr. Peter Mutsaers • Dr. Edgar Vredenbregt • Dr. Seth Brussaard • Extremestates of matter: Ultra-cold & ultra-hot, plasmas & gases; • Laser manipulation of atoms, electrons and ions; • Atom, electron & ion beams forfemto-nano science & engineering. / Applied Physics
Coherence & Quantum Technology (CQT) • Ultra-Cold Electron & Ion Beams: • Laser cooling & trapping; • Femtosecond (10-15 s) laser physics; • Ultra-low temperature • (0.001 - 10 kelvin) plasmas; • Femtosecond electron microscopy; • Sub-nanometer ion beam drilling & milling. Edgar Vredenbregt, Jom Luiten, Peter Mutsaers / Applied Physics
Ultracold plasmas I I 15 K ions e- V Electron temperature Taban et al., to be published Ultracold electron & ion beams Taban et al., Phys. Rev. Special Topics, 11, 050102 (2008) / Applied Physics
Coherence & Quantum Technology (CQT) • Theory of Quantum Gases: • Atoms trapped in an optical lattice; • Superfluidity of ultra-cold (nano-kelvin) • Fermi and Bose gases; • Quantum Plasmas & Beams. Servaas Kokkelmans • Laser Wakefield Acceleration: • Tera-watt “light bullet” laser physics; • Extreme high-energy-density plasmas; Seth Brussaard / Applied Physics
The poor man’s X-ray Free Electron Laser VICI project Luiten: Exploring extreme beam regimes for femtosecond electron imaging Femtosecond structural dynamics “The (bio)molecular movie...” Phase space density = Beam Brightness Luiten et al., PRL 93, 094802 (2004) Claessens et al., PRL 95, 164801 (2005) Van Oudheusden et al., JAP 102, 093501 (2007) / Applied Physics
Elementary Processes in Gas Discharges (EPG) • Staff: • Prof.dr.ir. Gerrit Kroesen • Prof.dr. Joost van der Mullen • Dr.ir. Eddie van Veldhuizen • Dr.ir. Peter Bruggeman • Dr.ir. Sander Nijdam • Dr.ir. Jan van Dijk • Prof.dr. Ute Ebert • Prof.dr. Marco Haverlag • Light and photons: Efficient lamps and EUV sources • Environmental technology: using plasmas for air / water cleaning • Biomedical technology: sterilisation; new medical treatments / Applied Physics
Elementary Processes in Gas Discharges (EPG) Plasmas: Heaven and earth / Applied Physics
Elementary Processes in Gas Discharges (EPG) Plasmas in lab and industry (1) / Applied Physics
Elementary Processes in Gas Discharges (EPG) Plasmas in lab and industry (2) Plasmas in lab and industry (2) / Applied Physics
Stereo-photography of Corona discharges S. Nijdam et al., Appl. Phys. Lett. 92 101502 (2008) / Applied Physics
Plasma & Materials Processing (PMP) • Staff: • Dr.ir. Erwin Kessels • Dr. Richard Engeln • Dr. Adriana Creatore • Dr. Ageeth Bol • Prof.dr. Fred Roozeboom • Prof.dr.ir. Richard van de Sanden • Plasma physics and chemistry of plasma & materials processing; • Advanced plasma and surface diagnostics • Micro- and nano-engineering of functional materials / Applied Physics
Plasma & Materials Processing (PMP) Physics and chemistry of plasma & materials processing Micro- and nano-engineering of functional materials Plasma chemistry Ion/radical densities/fluxes Energy distribution fcts. Plasma surface interaction Plasma enhanced CVD Dry etching Plasma-assisted ALD Thin films & devices Advanced plasma and surface diagnostics Ellipsometry Nonlinear surface spectroscopy Novel surface diagnostics (Laser) based gas phase diagnostics / Applied Physics
In situ dangling bond detection during a-Si:H growth 1 µm ZnO mc-Si Ag H-abstraction adsorption on DB weakly-adsorbed state insertion into Si-Si glass substrate High rate plasma deposition of amorphous and microcrystalline silicon: Understanding the film growth mechanism Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) / Applied Physics
In situ dangling bond detection during a-Si:H growth dangling bond absorption Evanescent wave cavity ring down absorption spectroscopy on dangling bonds Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) / Applied Physics
In situ dangling bond detection during a-Si:H growth Surface dangling bond density during growth ~5x1011cm-2 surface coverage ~5x10-4 !! Si-radical growth pulse Aarts et al. Appl. Phys. Lett. 90 161918 (2007) Aarts et al. Phys. Rev. Lett. 95 166104 (2005) / Applied Physics
Waar komen onze afstudeerders terecht? Lokale industrie (ASML, NXP, OTB-Solar, Fujifilm, FEI) Instituten (TNO, ECN, etc.) Promotieplaatsen bij diverse universiteiten (ook buitenland via de verschillende zeer internationaal georienteerde groepen) / Applied Physics
Plasma Physics and Radiation Technology • Plasma medium: common interest to the PPRT thrust area • Same fundamental knowledge reservoir • Plasmas investigated vary in density and temperatures • Intrinsic nonequilibrium medium • Utilize fundamental knowledge in various applications • Very good example of applied science Experiments and modeling approach / Applied Physics