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Diffusion

Diffusion. MSE 528 Fall 2010. PROCESSING USING DIFFUSION (1). • Case Hardening : --Diffuse carbon atoms into the host iron atoms at the surface. --Example of interstitial diffusion is a case hardened gear. Fig. 5.0, Callister 6e . (Fig. 5.0 is

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Diffusion

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  1. Diffusion MSE 528 Fall 2010

  2. PROCESSING USING DIFFUSION (1) • Case Hardening: --Diffuse carbon atoms into the host iron atoms at the surface. --Example of interstitial diffusion is a case hardened gear. Fig. 5.0, Callister 6e. (Fig. 5.0 is courtesy of Surface Division, Midland-Ross.) • Result: The "Case" is --hard to deform: C atoms "lock" planes from shearing. --hard to crack: C atoms put the surface in compression. 8

  3. PROCESSING USING DIFFUSION (2) • Doping Silicon with P for n-type semiconductors: • Process: 1. Deposit P rich layers on surface. Fig. 18.0, Callister 6e. 2. Heat it. 3. Result: Doped semiconductor regions. 9

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