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The need for Ultra Pure Water in the semiconductor industry

The need for Ultra Pure Water in the semiconductor industry. PRESENT DEVELOPMENT. Development > 32, 22 to 8 (6) nanometer 32 nm = 0.000032 mm The diameter of human hair is around 200 000 nanometers 200 000 / 8 = 25 000. KILLER PARTICLES.

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The need for Ultra Pure Water in the semiconductor industry

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  1. The need for Ultra Pure Water in the semiconductor industry

  2. PRESENT DEVELOPMENT Development > 32, 22 to 8 (6) nanometer 32 nm = 0.000032 mm The diameter of human hair is around 200 000 nanometers 200 000 / 8 = 25 000

  3. KILLER PARTICLES Membrane distillation can make purer water than state-of-the-art water purification technology

  4. ONLY VAPORIZED WATER MOLECULES PASS THE MEMBRANE Only vapour can leave the surface of the water, because of the surface tension. The surface tension stops all non-volatiles from leaving the feed water

  5. Estimated Water consumption in a 300mm wafer IDM fab • For a fab water consumption is: 1500 m3/hour    • Per wafer = 8.8 m3 • Per clean per wafer = 44 liter • This includes all water consumption: • idle UPW flows, chemical waste treatment, gas-exhaust washing, • Reject water from purification • Cooling water • Sanitary water for staff: toilets.... …

  6. Demanded by nanoelectronics companies • Low risk (no surprises) • High reliability (good uptime) • Solid company (well established) • Good service world wide (time to repair)

  7. Technical needs High contaminant retention Low added contaminants Reliable performance Automated Performance Cleaning, Descaling Disruptive

  8. PRESENT DEMO

  9. PERFORMANCE • Recycling of water • Zero Liquid Discharg • Energy recovery by use of waste heat • Lower cost

  10. REUSE AT POINT-OF-USE Removal of several contaminant types in one process enables UPW in fewer steps. Fewer treatment steps enable compact equipment. 18/11/2014 10

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