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Nanolithography And Nanofabrication ELEC 7950 Special Topics on Nanoscale Science and Technology

Nanolithography And Nanofabrication ELEC 7950 Special Topics on Nanoscale Science and Technology Summer 2003 Y. Tzeng Professor, ECE Auburn University. http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf. Intel’s lithography Roadmap.

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Nanolithography And Nanofabrication ELEC 7950 Special Topics on Nanoscale Science and Technology

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  1. Nanolithography And Nanofabrication ELEC 7950 Special Topics on Nanoscale Science and Technology Summer 2003 Y. Tzeng Professor, ECE Auburn University

  2. http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  3. Intel’s lithography Roadmap www.intel.com/technology/itj/2002/volume06issue02/ art06_lithographyroadmap/p03_roadmap.htm

  4. Sub-wavelength lithography www.intel.com/technology/itj/2002/volume06issue02/ art06_lithographyroadmap/p03_roadmap.htm

  5. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  6. TeraHertz transistor with 15nm gate Transistor physics and material properties will not prevent continuing on the path of Moore’s Law for some years to come. The key issue will be the availability of lithography equipment that can pattern sub-50nm features, in high-volume applications, at affordable costs. www.intel.com/technology/itj/2002/volume06issue02/ art06_lithographyroadmap/p03_roadmap.htm

  7. http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  8. http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  9. http://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdfhttp://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdf

  10. http://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdfhttp://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdf

  11. http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  12. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  13. http://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdfhttp://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdf

  14. http://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdfhttp://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdf

  15. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  16. http://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdfhttp://users.ece.gatech.edu/~alan/11-6-Mohanty-Extreme%20UV%20Litho.pdf

  17. Intel adopts the following strategy: • Rapid transition to each new generation of lithography equipment, i.e. shorter wavelengths. • Using fast (high-run-rate) lithography tools. • Reusing lithography equipment over multiple process generations. • Intel expects that this strategy will allow lithography to continue to be affordable into the 45nm technology generation and beyond. www.intel.com/technology/itj/2002/volume06issue02/ art06_lithographyroadmap/p03_roadmap.htm

  18. X-Ray Lithography http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  19. Electron Beam Lithography http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  20. Focused Ion Beam Lithography http://personal.cityu.edu.hk/~appkchu/AP4120/5v.pdf

  21. Atom Optics G. Timp, R.E. Behringer, D.M. Tennant, J.E. Cunningham, M. Prentiss and K.K. Berggren, “Using Light as a Lens for Submicron, Neutral-Atom Lithography,” Physical Review Letters 69(11), 14 September 1992. http://www.iap.uni-bonn.de/ag_meschede/atomoptik/nist.pdf

  22. AFM images http://www.iap.uni-bonn.de/ag_meschede/atomoptik/nist.pdf

  23. http://www.iap.uni-bonn.de/ag_meschede/atomoptik/nist.pdf

  24. http://physics.ust.hk/phkywong/presentations/bec.ppt

  25. http://physics.ust.hk/phkywong/presentations/bec.ppt

  26. http://physics.ust.hk/phkywong/presentations/bec.ppt

  27. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  28. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  29. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  30. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  31. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  32. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  33. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  34. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  35. http://www.stanford.edu/group/quate_group/LithoFrame.html

  36. http://www.stanford.edu/group/quate_group/LithoFrame.html

  37. http://www.stanford.edu/group/quate_group/LithoFrame.html

  38. http://www.stanford.edu/group/quate_group/LithoFrame.html

  39. http://www.stanford.edu/group/quate_group/LithoFrame.html

  40. http://www.stanford.edu/group/quate_group/LithoFrame.html

  41. http://www.stanford.edu/group/quate_group/LithoFrame.html

  42. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  43. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  44. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  45. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  46. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  47. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  48. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  49. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

  50. http://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdfhttp://www-inst.eecs.berkeley.edu/~ee143/f2002/Lectures/Lec_28.pdf

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