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Changes made to e-Tapeout NTO system

Changes made to e-Tapeout NTO system. Common to all user Method of device creation are now tightly link to SMIC’s process structure so that user does not need to do wild guessing any more. A new edit in place mode for LDDI edit function

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Changes made to e-Tapeout NTO system

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  1. Changes made to e-Tapeout NTO system Common to all user Method of device creation are now tightly link to SMIC’s process structure so that user does not need to do wild guessing any more. A new edit in place mode for LDDI edit function A more precise relationship between file and form are defined during IP merge request, detailed instructions are given at attached word file. New features opened to interested customers (need special account to activate these functions, welcome to contact your account CE and ask for testing account to experience these changes) A more efficient hierarchy structure have implemented to design rule document system , resulting fewer and faster selection for user input during form filling. A new chip information database were implemented to enhance options covered when filling foundry service form Mask combination in LDDI form are now directly linked to the options selected in foundry service form, user can now change mask selection without memorizing meaning less mask code numbers.

  2. New device creation method (Common) • Technology type now support hierarchy structure • Redefine key items to more design related wording • Consolidate same type of input to single form from separated forms OLD NEW

  3. New LDDI edit function (Common) • LDDI form now have edit in place mode for easier and faster modification

  4. Foundry Service Request structure ( New) • With new build-in chip information database in place, the new FSR questions can now reflect technology dependent options • LDDI form are now linked to FSR form, so mask combination in LDDI are related to the options specified in FSR

  5. LDDI generation function (New) • LDDI are now generated according to the questions user selected in FSR • Mask combination are now related to the technology type and process information user entered during device creation and FSR input.

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