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Metamaterials. Goal. Have a patterned material that blocks infrared light. Project Outline. Thick 1D structures (50-100 microns) Variety of 2D structures (2-20 microns) Phase mask creation Thick 3D structures (50-100 microns) via phase mask interference lithography
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Goal Have a patterned material that blocks infrared light.
Project Outline • Thick 1D structures (50-100 microns) • Variety of 2D structures (2-20 microns) • Phase mask creation • Thick 3D structures (50-100 microns) via phase mask interferencelithography • Sol gel process to create 3D structures from other materials • Testing of photonic and mechanical properties
Calculations n λ = 2 d sinθ ~2000 nm wavelength range 2 µm spacing 2-D & 3-D material. infrared region
Potential Obstacles • Time Constraints • Runtime of experiments • Gaining access to laboratories and becoming trained on equipment • Attaining a thick photoresistlayer • uniformity issues • adhesion problems
Potential Obstacles • New Field of Research (Interference Lithography, Metamaterials) • Trial and error • Limited background info • Large Room for Error • Multistep process • Measurements and spacing must be very precise to get desired results
CurrentPlans Continuedesigning 2D print models and create 2D phase masks Research photoresistapplication methods and Interference Lithography