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PUT JOSH WEB-STREAM HERE. 4/30/2010 Iowa State University EE492 – Senior Design II. IRP Review: A TEST CHIP FOR ELECTROMIGRATION STUDIES Karl Peterson (EE), Emmanuel Owusu ( CprE ), and Joshua Ellis (EE). Our project is special…. International collaboration
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4/30/2010 Iowa State University EE492 – Senior Design II IRP Review:A TEST CHIP FOR ELECTROMIGRATION STUDIESKarl Peterson (EE), Emmanuel Owusu (CprE), and Joshua Ellis (EE)
Our project is special… • International collaboration • Product conceptualization & specification in addition to design • Integrated circuit (IC) rather than system design • Research-orientated objectives
Problem Statement • Design a test chip to support ISU research on electromigration & IC reliability • The chip must include test structures composed of actual metal interconnects in a modern silicon process • Must be capable of interfacing with a controller to allow electrothermal conditions in the chip to be varied and monitored.
The Big Picture • Electromigration – a complex physical phenomena that causes mechanical stress in metal interconnects • Important failure mechanism in ICs • Strong, non-linear dependence on current-density and temperature • Need models for electromigration that predict reliability under practical conditions Electromigration in progress!
Electromigration testing • Subject interconnects to variable electrothermal stresses • Measure time-to-failure of many samples • Analyze statistics, develop models, fit data, etc. • Use accelerated lifetime technique • Very high temperatures and current densities!
Proposed Solution • Proposed IC contains 8 identical metal test structures • Current-steering Digital-to-Analog Converter provides 0-25mA to test structure • On-die analog temperature sensing circuits • Open-circuit detection • Control logic with serial interface • Process technology:0.18 µm standard CMOS
Test Structure • Single-layer metal interconnect with serpentine pattern
Test structure – detail Corners reinforced to mitigate current crowding
Current-Steering DAC • Current range of 0 to 25 mA • 7 bit resolution • LSB Current – 200 µA • Current-Steering Architecture • Binary-weighted sources • Constant power • Open Circuit Detection • Two inverters on the output 0010110 DAC
Temperature sensor • Compact, CMOS-based sensor design • 5 sensor distributed throughout the floor plan
Control Logic • Serial interface • Simple protocol • Low pin-count
Digital flow • Needed standard cell library for synthesis • Free, scalable library did not meet design rules of our process • Extensive work to customize , re-verify standard cells
Auxiliary blocks • Master current switch • Reference-distribution network
Physical Design • Floorplan symmetry to prevent uncontrolled experimental variables • Significant redundancy and reinforcement of non-test blocks for reliability • Final design is 860 µm x 860 µm
Simulations & Verification • Analog verification: relevant performance parameters for each block tested over full PVT range with 500-run statistical simulations • Digital verification: functional simulations, timing analysis • System-level, mixed-signal verification: several long transient simulations covering typical operation sequence
Top-level Functional Simulation #1 VDD rises #2 Reference current starts #3 <000> written to address reg. #4 <0101010> written to address reg. #5 master current switch enabled #6 test current settles at predicted value
Backup slides – test results • DAC • Temperature sensor • Top-level functional