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Showerhead Application in Plasma Reactor class presentation by Cai Wang Auburn University

Showerhead Application in Plasma Reactor class presentation by Cai Wang Auburn University. Content. What is showerhead using in the reactor? Showerhead schematics Benefit of showerhead Comparison of using and not using showerhead Main issues solution Conclusion. What is showerhead?.

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Showerhead Application in Plasma Reactor class presentation by Cai Wang Auburn University

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  1. Showerhead Application in Plasma Reactorclass presentation byCai WangAuburn University

  2. Content • What is showerhead using in the reactor? • Showerhead schematics • Benefit of showerhead • Comparison of using and not using showerhead • Main issues • solution • Conclusion

  3. What is showerhead? • Showerhead is a perforated or porous planar surface to dispense reactant gases more-or-less uniformly over a second parallel planner surface. The pas inlet showerhead contains several hundred vertically oriented gas-distributed holes.

  4. Showerhead schematic Ref. Heru Setyawan,Chemical Engineering Science 57 (2002)497 –506

  5. Benefit • Deposit will remain uniform fairly independently of the main flow. Ref. A. Armaou, P.D. Chemical Engineering Science 54 (1999) 3307

  6. Comparison of using showerhead and not Ref. Chemical engineering Science, Vol. 52, No.17, pp 2911

  7. Main issue • Heat conduction increases as the spacing decreases, make the in-coming reactant decomposed, causing clogging.The flow emerging from the holes on the showerhead face alters the species transport to and from the surface and, therefore, effect the consumption and production of reactant gases at the surface.

  8. Solution • Adequate cooling throughout the diffuser block----prevent perfect uniformity of gas flow. • Cooling with internal water channel. The holes in the block for the gas flow are small enough and closely enough spaced to provide a practically inlet gas flow---- keep the inlet diffuser free from deposit.

  9. Solution Ref. S.M.vernon, Close spaced MOCVD reactor for 1%-uniform growth of In-containing materials on 4” substrates.

  10. Another issue and solution • Issue: the problem encountered in delivering particles from atmospheric pressure into a very low-pressure environment is a tendency of the capillary pressure reducer to be clogged by particles. • Solution: A pressure reduction system using a pressure control valve was developed to deliver gas –particle mixture from a high-pressure environment to the very low-pressure chamber.

  11. Showerhead used in a low-pressure parallel plate chemical vapor deposition reactor Ref. Heru Setyawan,Chemical Engineering Science 57 (2002)497 –506

  12. Conclusion • Using showerhead can increase the uniformity greatly • Cooling with internal water channel to prevent showerhead holes clogging • A pressure reduction system using a pressure control valve to prevent the capillary pressure reducer clogging

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