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Cost-Effective Atomic Layer Deposition System

Explore a cost-effective approach to Atomic Layer Deposition (ALD) with the design and construction of a budget-friendly system for depositing thin films. Learn about the process, methods, and future work involved in this innovative project.

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Cost-Effective Atomic Layer Deposition System

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  1. Cost-Effective Atomic Layer Deposition System Brendan Marvin, Andrew Williams, Trevor Folska-Fung, Carson Silsby

  2. Background: Atomic Layer Deposition Atomic Layer Deposition (ALD) • Subclass of chemical vapor deposition (CVD) • Selective thin film deposition (~ 1 Å/cycle) • Commercial systems are expensive • Can cost upwards of $150,000 Diagram of surface reaction of TMA and H2O to create Al2O3 with one cycle of ALD creating a monolayer of Al2O3 Martin E. McBriarty, “Atomic Layer Deposition”, Feb. 20, 2019 • Well studied for metal oxide deposition • Al2O3, ZrO2, HfO2 • High-k gate oxides for microelectronics

  3. Objectives • Design, build, and characterize a bench-top ALD system that deposits Al2O3 • Stay under budget ($10,250) • Achieve deposition of Al2O3 • Create recipe for deposition of Al2O3 Al2O3 SEM images from Lubitz et al. • Create a lab SOP that can be implemented for the CHE 444/544 lab sections • Expand deposition to other metal compounds: TiO2, SiO2, SnO2, CoSx, and CoP EDS spectra for Al2O3 from Lubitz et al.

  4. Methods • Find available used parts for the system from Dr. Herman, Dr. Arnadottir, etc. • Consolidate all resources and purchase additional parts • Test vacuum chamber • Confirmation of vacuum strength in chamber • Identification of possible leaks, if any • Build a programmable logic controller (PLC) • Control precursor and co-reactant flows • Characterize film deposition • Rate and uniformity characterized by Ellipsometry • Material composition determined by spectrometry A programmable logic controller • Write standard operating procedure (SOP) • Trimethylaluminum bottle change • Operating ALD

  5. Work So Far • Meetings with Dr. Herman, Dr. Arnadottir, and Michael Hayes • Assembled vacuum chamber from donated parts • Holds a low vacuum • Currently waiting for purchased materials to continue building • O-rings, pressure gauge, temperature controller The current ALD chamber in Johnson 200. Not pictured is the mechanical vacuum pump.

  6. Future Work • Continue building the vacuum chamber • Test the seal of the chamber and vacuum • Need pressure below 2 torr • Begin deposition testing • Characterization of deposited films • Ellipsometry for thickness and uniformity • Present at the Engineering Expo • Write a lab SOP for implementation into CHE 444/544 lab course

  7. Questions?

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