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IEEE Central NC EDS/MTT/SSC Society Friday, Nov. 5th, 2010 The Nanoscale MOSFET: Physics and Limits Mark Lundstrom. Electrical and Computer Engineering and Network for Computational Nanotechnology Birck Nanotechnology Center Purdue University, West Lafayette, Indiana USA.
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IEEE Central NC EDS/MTT/SSC Society Friday, Nov. 5th, 2010The Nanoscale MOSFET:Physics and LimitsMark Lundstrom Electrical and Computer Engineering and Network for Computational Nanotechnology Birck Nanotechnology Center Purdue University, West Lafayette, Indiana USA
21st Century: microelectronics nanoelectronics transistors per cpu chip Lundstrom
nanoscale MOSFETs 2010 gate electrode channel ~ 32 nm gate oxide EOT~ 1.1 nm S G D source drain SiO2 silicon
gate-voltage controlled current source gate-voltage controlled resistor MOSFET IV characteristic circuit symbol D G S (Courtesy, Shuji Ikeda, ATDF, Dec. 2007)
gate-voltage controlled resistor MOSFET IV: low VDS VG>VT 0 VD
gate-voltage controlled current source 2 MOSFET IV: high VDS 0 VG VD
velocity saturation 107 velocity cm/s ---> 105 104 electric field V/cm --->
(Courtesy, Shuji Ikeda, ATDF, Dec. 2007) MOSFET IV: velocity saturation 0 VG VD
carrier transport nanoscale MOSFETs Velocity (cm/s) D. Frank, S. Laux, and M. Fischetti, Int. Electron Dev. Mtg., Dec., 1992. Lundstrom
~1995 - 2000 Moore’s Law? Molecular electronics http://www.eng.yale.edu/reedlab/ Lundstrom
objectives Present a simple, physical picture of the nanoscale MOSFET (to complement, not supplement simulations). Discuss ballistic limits, velocity saturation, and quantum limits in nanotransistors. Compare to experimental results for Si and III-V FETs Discuss scattering in nano-MOSFETs Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
how transistors work 2007 N-MOSFET electron energy vs. position electron energy vs. position (Courtesy, Shuji Ikeda, ATDF, Dec. 2007) E.O. Johnson, “The IGFET: A Bipolar Transistor in Disguise,” RCA Review, 1973
MOSFETs are barrier controlled devices 2) region under strong\ control of gate 1) “Well-tempered MOSFET” 3) Additional increases in VDS drop near the drain and have a small effect on ID M. Lundstrom, IEEEEDL, 18, 361, 1997. A. Khakifirooz, O. M. Nayfeh, D. A. Antoniadis, IEEE TED, 56, pp. 1674-1680, 2009.
current flows when the Fermi-levels are different gate Lundstrom
LDOS “device” contact 1 contact 2 “top of the barrier model” energy position Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
ballistic MOSFET: linear region near-equilibrium Lundstrom
linear region with MB statistics Boltzmann statistics: (MOS electrostatics) ✔ Lundstrom
ballistic MOSFET: linear region near-equilibrium Lundstrom
relation to conventional expression ballistic MOSFET conventional MOSFET Lundstrom
ballistic MOSFET: on-current Lundstrom
saturated region with MB statistics Boltzmann statistics: ✔ Lundstrom
under low VDS Lundstrom
under high VDS Lundstrom
velocity vs. VDS Lundstrom
velocity vs. VDS Velocity saturates in a ballistic MOSFET but at the top of the barrier, where E-field = 0. Lundstrom
2007 N-MOSFET (Courtesy, Shuji Ikeda, ATDF, Dec. 2007) velocity saturation in a ballistic MOSFET velocity saturation Lundstrom
aside: relation to conventional expression ballistic MOSFET conventional MOSFET Lundstrom
the ballistic IV (Boltzmann statistics) ballistic on-current ballistic channel resistance K. Natori, JAP, 76, 4879, 1994. Lundstrom
comparison with experiment: Silicon • Si MOSFETs deliver > one-half of the ballistic on-current. (Similar for the past 15 years.) • MOSFETs operate closer to the ballistic limit under high VDS. A. Majumdar, Z. B. Ren, S. J. Koester, and W. Haensch, "Undoped-Body Extremely Thin SOI MOSFETs With Back Gates," IEEE Transactions on Electron Devices, 56, pp. 2270-2276, 2009. Device characterization and simulation: Himadri Pal and Yang Liu, Purdue, 2010.
comparison with experiment: InGaAs HEMTs Jesus del Alamo group (MIT) Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
X X X transmission and carrier scattering λ0 is the mean-free-path for backscattering Lundstrom
the quasi-ballistic MOSFET Lundstrom
on current and transmission Lundstrom
the quasi-ballistic MOSFET Lundstrom
scattering under high VDS Lundstrom
connection to traditional model (high VDS) how do we interpret this result? Lundstrom
the MOSFET as a BJT “base” ‘bottleneck’ “collector” Lundstrom
outline 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom
3) The on-current is controlled by the ballistic injection velocity - not the high-field, bulk saturation velocity. 2) The channel resistance has a lower limit - no matter how high the mobility is. physics of nanoscale MOSFETs 4) Channel velocity saturates near the source, not at the drain end. 1) Transistor-like I-V characteristics are a result of electrostatics. Lundstrom
limits to barrier control: quantum tunneling 4) 3) 1) 2) from M. Luisier, ETH Zurich / Purdue
21st Century electronics? Moore’s Law? Lundstrom
21st Century electronics 1) Information processing dominated by “Si CMOS” 2) SOC’s complemented by “CMOS+” technologies 3) and….. macroelectronics, power electronics, PV, solid-state lighting, thermoelectrics, … Lundstrom
for more information 1) “Physics of Nanoscale MOSFETs,” a series of eight lectures on the subject presented at the 2008 NCN@Purdue Summer School by Mark Lundstrom, 2008. http://nanohub.org/resources/5306 2) “Electronic Transport in Semiconductors,” Lectures 1-7, by Mark Lundstrom, 2009. http://nanohub.org/resources/7281 Lundstrom
questions 1) Introduction 2) The nano-MOSFET 3) The ballistic MOSFET 4) Scattering in nano-MOSFETs 5) Summary Lundstrom