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Comparison of before/after blanking amplifier replacement 1/19/11

Comparison of before/after blanking amplifier replacement 1/19/11. Process Flow. substrate: silicon piece spin coat: 6% HSQ 2500 rpm, 1250 rpm/sec, 60 sec hot plate bake 80 C, 4 min thickness = 137 nm expose 100 kV, 2 nA, shot pitch = 2 nm

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Comparison of before/after blanking amplifier replacement 1/19/11

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  1. Comparison of before/after blanking amplifier replacement 1/19/11

  2. Process Flow • substrate: • silicon piece • spin coat: • 6% HSQ • 2500 rpm, 1250 rpm/sec, 60 sec • hot plate bake 80 C, 4 min • thickness = 137 nm • expose • 100 kV, 2 nA, shot pitch = 2 nm • dose = 1500, 3000, 5000, 7000, 10000 uC/cm2 • develop • 25% TMAH, 30 sec immersion • 1 min 30 sec, DI water rinse

  3. conversion 1 hsqcircle500-001.v30, JBXFILER, output step = 1000 (1 nm grid) width = 250 nm outer diameter = 5 um

  4. Dose = 1500 uC/cm2 before after

  5. Dose = 3000 uC/cm2 before after gap gap

  6. Dose = 5000 uC/cm2 before after rough edge / fracture shape positioning error gap

  7. Dose = 7000 uC/cm2 before after rough edge rough edge

  8. Dose = 10,000 uC/cm2 before after rough edge rough edge

  9. Conclusion • new blanking amplifier confirmed to have working waveform, but the pattern result of the ring is the same

  10. Sequential ordering of primitive / fracture shape exposure conversion 5 single3.v30, created by Ming Lu, Brookhaven National Lab output step = 1000 (1 nm grid) Ming’s pattern has primitives exposed in a clockwise progressive order. (JBXFILER and Layout BEAMER primitives are exposed in random order.) The first primitive is at 3 o’clock. exposure order first primitive

  11. compare conversion method 1 to conversion method 5 (both with new amplifier)

  12. Dose = 1500 uC/cm2 conversion method 1 conversion method 5

  13. Dose = 3000 uC/cm2 conversion method 1 conversion method 5 beginning / end

  14. Dose = 5000 uC/cm2 conversion method 1 conversion method 5

  15. Dose = 7000 uC/cm2 conversion method 1 conversion method 5

  16. Dose = 10,000 uC/cm2 conversion method 1 conversion method 5 beginning / end

  17. Conclusion • Ming’s pattern looks much smoother at all doses • for conversion method 1, primitives are exposed in random order, so larger position changes are being made by PDEF • for conversion method 5, each primitive is exposed in a clockwise order, so there are smaller position changes being made by PDEF • therefore, the ring is suffering from a positioning related error • the rings expose very quickly (<< 1 sec) so the positioning error is not likely due to beam drift. • it seems the error is either due to PDEF itself, or some noise that is coupling into PDEF

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