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Kurt J Lesker

www.lesker.com + 44 (0) 1424 458100 saleseu@lesker.com. Kurt J Lesker Company. Kurt J Lesker. Kurt J Lesker… Is a global supplier and manufacturer of high & ultra high vacuum solutions Established in 1954.

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Kurt J Lesker

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  1. www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  2. Kurt J Lesker Company Kurt J Lesker Kurt J Lesker… Is a global supplier and manufacturer of high & ultra high vacuum solutions Established in 1954 www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  3. Global Customer Support 6 Global distribution centres 8 Strategic Sales Offices www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  4. Kurt J Lesker Company LTD Kurt J Lesker European Headquarters Established in 1991 New facility 2008 Centre for European operations Sales support office Design office Test & Assembly Clean Room Extensive warehouse facilities www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  5. Strategic Business Segments www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  6. Vacuum Components Kurt J Lesker www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  7. Manufacturing Kurt J Lesker Vacuum Chamber ManufacturingPittsburgh- USA Hastings – UK Capabilities Standard vacuum chambers Complete bespoke Solutions Quality Management 3D Inspection facilities ISO Certification www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  8. MaterialsGroup Kurt J Lesker support a wide range of production groups Solar panel manufacture Semiconductor Electronic devices Optical coatings Automotive lighting R&D Complete custom solutions available Materials Backing plates Filaments Kurt J Lesker www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  9. Process Equipment Division Kurt J Lesker • PVD Tools • 21 Standard vacuum platforms • Custom PVD Tools • Bespoke design and process solutions • Thin Film Deposition Expertise: • Thermal • E-Beam • OLED • sputtering • Metal /Organic chemical vapour deposition • Atomic layer deposition www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  10. Process Equipment Division Sputtering /OLED Sources Sputtering Linear Cathodes Kurt J Lesker We develop & manufacture our own range of sputtering/ OLED sources In addition we are able to offer a wide selection of linear cathodes www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  11. System Designers…Manufacturers…Experts Kurt J Lesker Systems PVD Series PVD 75 PVD 225 PVD 250 PVD 500 NANO 36 Features • Manufacturing systems since 1974 • Chamber manufacturers • Extensive application knowledge • USA & UK clean room assembly areas • KJL designed and built Magnetron Torus sputter guns • KJL designed and built OLED sources • 8 standard system platforms • Custom solutions available • Magnetron sputtering • Thermal evaporation • Atomic layer deposition • E-beam evaporation • Organic evaporation CMS Series CMS-18 CMS-24 LAB-18 SPECTROS Series Mini-SPECTROS SPETROS 100/150 Super-SPECTROS 150/200 AXXIS LUMINOS Deposition Techniques: OCTOS ALD Series www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  12. NANO36 • Adaptable chamber options • Compact integrated design • High speed diffusion pump • Single wide range gauge • PLC control with touch screen interface • Film thickness monitor with thermal sources • Multi-technique options: • Up to 3 metal thermal sources • Torus circular magnetron sputtering sources 1”-4” options Options: • SS bell jar • SS chamber • Dry roughing pump • 300l/s Turbo • Substrate rotation • Heating to either 150 C or 350 C www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  13. NANO36 • The Nano36 is the newest and most economical deposition system • It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world • The Nano36 is our most affordable deposition platform available designed with the entry to mid level user in mind • The Nano36 will accommodate most evaporation processes as well as magnetron sputtering • The Nano36 has a small footprint www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  14. Process control • PLC control • This affordable, full feature system offers reliable PLC control with a color touch screen interface • Single button commands and manual operation are accessed from the touch screen • This offers a simple and convenient user interface with the Nano36 www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  15. Process Chamber 16” x 16” Box Chamber as shown. Also a 12” Diameter x 18” high glass bell jar available. • Chamber options • The Nano36 has standard configurations to suit most users • Chamber choices are either a simple 12”Diameter x 18” High glass bell jar or a 16” x 16” stainless steel box chamber • The box chamber door opens wide for easy chamber access • Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutes www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  16. Vacuum • Pumps • The Nano 36 has 3 standard High Vacuum pumping options: 300L/S Turbo, 685 L/S Turbo, or a 700 L/S Diffusion Pump High Vacuum pump choices include 300 L/S Turbo, 685 L/S Turbo, or 700 L/S Diffusion Pump Dry Foreline/Roughing pumps available (as pictured) as well as oil sealed rotary vane pumps www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  17. Platen Dual Quartz Lamp Heaters • Flat plate substrate fixture • Substrate options include primary rotation and heating up to 350 C with dual quartz lamp heaters Substrate Plate on central twist lock hub. Substrate can be held in a fixed position or rotated about the central shaft. www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  18. Platen • Flat plate substrate fixture • The Nano36 can accommodate up to an 8” diameter substrate mounting plate • One single 8” wafer or multiple smaller wafers can be held in place • The substrate plate can be easily removed or placed into the system with either a “lift up and out” hub mount or a twist-lock mounting Pin/Hub mounted platen can easily be lifted and removed with one hand. www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  19. Film Thickness • Film thickness control • Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller • The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processes Twist-Lock platen with quartz crystal monitor head. Front Panel Film Thickness Controller www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  20. Evaporation • Thermal Evaporation Source • The Nan36 can be configured with three thermal evaporation sources on the base plate • The evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination • The sources also are stood off of the base plate of the chamber and are mounted on water cooled posts to limit excess heating of the chamber • Thermal sources can be filament, basket heaters, box heaters, boats (coated and uncoated), rods, and screens • Easy access to the boats and the mounting posts makes these sources very user friendly • The Kurt J. Lesker Company is a global supplier of a large range of deposition sources and deposition materials Up to Three thermal evaporation sources can be accommodated. The thermal sources are well shielded from each other and the chamber by the use of shielding. www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  21. Sputtering • Torus Sputtering Source • The Nan36 can be configured with two thermal evaporation sources on the base plate • Pneumatic shutters • DC, RF or Pulsed DC • Easy access for target change www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  22. Utilities • Utilites • The Nano36 has a small footprint and comes with heavy duty wheels and retractable mounting pads. This makes the system very easy to wheel into place, set up, and level • Utilities are accessed from central point on the back of the system so utilities hook up is easy and straight forward • This makes the Nano36 very portable. It is easy to move and set up anywhere Utilities located across the back panel of the systems frame www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  23. Service and warranty • Yearly service package • One day • Two days • Three days • Four days • Five days Package includes: • Service/preventative maintenance and/or Training • Excludes: • Parts, Travel and subsistence • Warranty • 12 months on all systems • Options within warranty period: • 1 year extended warranty • 2 years extended warranty www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  24. NANO 36 benefits • Designed for: • Universities • Industrial and Government laboratories • R&D applications • Compact footprint design • Multiple chamber options • Easy to use • Plug & Play Installation • Quick Deliver • Cost Effective Price • A professional and attractive system that is self contained and ready to work, the Nano36 is manufactured with quality components supplied and stocked by the Kurt J. Lesker Company. We provide the quality, availability, and economy that our customers have come to expect from us www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  25. PVD 75 Features • D-shaped 304 stainless steel chamber • Aluminium door with rectangular viewport • Turbomolecular or cryogenic pumping • Manual touch-screen • Single, multiple or custom substrate fixtures • Fully enclosed “zero” clean room footprint design • Multi-technique options: • up to 3 Torus circular magnetron sputtering sources • multi-pocket electron beam evaporation source • multiple thermal evaporation sources • Options: • Recipe-controlled PC based process automation • Glow discharge / RF Bias www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  26. Framework • Fully enclosed system cabinet • Can be flush mounted in clean room wall • Utilities: Single service drop (220VAC, 50Hz, single phase, • 30 Amps-- based on configuration). Dedicated earth ground required • E-beam power supply: 400V AC/ 3phase/ 50Hz/ 40amps • Compressed air ¼” Swagelok @ 80 psi • Dry Nitrogen Vent Gas ¼” Swagelok @ 10 psi • Water: Typically 2 to 3 gpm, 25 C @ 50 psi • Process Gas ¼” Swagelok @ 5 to 7 psi (if applicable) • Leveling pads • Options: • 400VAC, 50/60Hz, 3 phase, 5-wire, 30 Amps power distribution www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  27. Process Chamber • D-shaped • 304 SS chamber • 14" x 24" D-shaped • ISO-250 top-plate & base plate ports • Aluminum Door with 5.25”x 3.25” viewing area • ISO 100 & 160 gauging & pumping ports www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  28. Sputtering • Up to 3 TorusMagnetron sources • 1”- 4” diameter • Axial, right angle, flex and custom mounts • Integral flip or swing shutters • RF, DC, pulsed DC power • Mass flow controlled gas inlet • Manual or automatic upstream pressure control • Compression fittings to adjust source to substrate distance • VHV compatible Options: • High strength magnet upgrade for use when depositing magnetic materials • Gas injection ring and deposition chimney www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  29. E-Beam • Electron Beam Evaporation Source • KJLC 4 pocket (8cc) E-Beam gun • 5kW solid state power supply with programmable sweep and automatic crucible indexing • High voltage discharge hook • Includes all electrical and water feedthroughs and shielding • One pneumatically actuated source shutter • 14” throw distance www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  30. Evaporation • Thermal Evaporation Source Module • Up to 3 Thermal Source assembly with water cooled high current feedthroughs (for sequential deposition) • 2 kW Power Supply • Computer controlled 3-Position Source Selection Switch • 1 pneumatically actuated shutter covers all sources • Cross contamination shielding • Options: • Additional 2 kW power supply and transformer to allow co-deposition • Upgrade to 4kW power supply and transformer in place of 2 kW www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  31. Organic • Low temperature organic evaporation source • KJLC 10cc LTE organic material evaporation source with integrated pneumatic flip shutter (Up to 6 sources may be configured in the system) • KJLC LTE evaporation source power supply • Options: • LTE sources • - 1cc • - 30cc www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  32. Platen • Substrate holder • Non-rotating, top mounted substrate platen (12”) using KJLC multi-site substrate fixture • Single or multiple substrates Options: • Rotary drive (up to 20rpm) for platen, variable speed • Pneumatically actuated flip style substrate shutter (compatible with substrates up to 8”) • Pneumatically actuated swing style substrate shutter (compatible with substrates up to 4”) • Custom configurations are available • Substrate heating options: • 150  C - 350 C (quartz lamp) • Up to 600 C (resistive element, compatible with only substrates up to 4”) www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  33. Vacuum • Pumps • 260 l/s Pfeiffer turbomolecular pump standard • Backing/roughing pump • Rotary vane mechanical pump • Options: • 685 l/s Pfeiffer turbomolecular • 1500 l/s CTI cryogenic pump • Oil free Scroll Pump • Base Pressure • 5 x 10-7 mbar or less with 260 l/s turbo • 2 x 10-7 mbar or less with 685 l/s turbo • 5 x 10-8 mbar or less with 1500 l/s cryo pump www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  34. Pressure • Gauges • Wide range vacuum gauge reads from atmosphere to 10-10 mbar (Ion gauge and Pirani) • Pirani gauge in Cryo / foreline (when applicable) • Readout is displayed on system control panel • Options: • Capacitance manometer for sputtering applications www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  35. Pumping • 260 l/s turbomolecular pump (standard) • 5 x 10-6 in 18 minutes • 5 x 10-7 Overnight • Base Pressure 3 x 10-7 mbar • 685 l/s turbomolecular pump (option) • 5 x 10-6 in 16 minutes • 2 x 10-7 in 35 minutes • Base pressure 1 x 10-7 mbar • 1500 l/s cryogenic pump (option) • 5 x 10-6 in 4 minutes • 5 x 10-7 in 10 minutes • 5 x 10-8 in 65 minutes • Base pressure 2 x 10-8 mbar • Pump down times based on clean and dry • properly conditioned chamber www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  36. Process control • Process • PC based with optional Recipe-Control • Touch screen controller • Film thickness monitor/controller • Automatic pump down and vent • Integrated power distribution • Mass flow controlled gas inlet • Options: • Heating • Cooling • Substrate bias • Ion Source www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  37. Computer control • PC-based control system • KJLC “C-Ware” Visual Basic based software (Windows XP) • Screen layouts follow the guidelines of SEMI E95-0200 • Includes Graphical User Interface (When applicable): • Vacuum • Deposition • Gas • Motion • Cooling • Heating • Options: • Recipe driven computer control • Creation and storage using Microsoft Access database • Selection of “pre-written” recipe • Edit, copy of existing recipes www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  38. Service and warranty • Yearly service package • One day • Two days • Three days • Four days • Five days Package includes: • Service/preventative maintenance and/or Training • Excludes: • Parts, Travel and subsistence • Warranty • 12 months on all systems • Options within warranty period: • 1 year extended warranty • 2 years extended warranty www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  39. PVD 75 benefits • Designed for: • Universities • Industrial, Government laboratories • R&D applications • Small batch production • “zero” clean room footprint design • Plug & play installation • Quick delivery • Cost effective price: • Thermal $65K - $120 • Sputter $90K - $180K • E-beam $150K - $220K • Organic on request www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

  40. Kurt J Lesker website and catalogue Over 14,000 standard products are found in our catalogue Kurt J Lesker Our website offers “real time” information on all our products & services www.lesker.com+ 44 (0) 1424 458100 saleseu@lesker.com

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