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Fiber Patterning. Project goals: Deposit coplanar electrodes on the surface of an optical fiber Use these electrodes as a mask to remove the optical core and replace it with an electro-optic polymer waveguide Remove excess polymer from surface of fiber
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Fiber Patterning • Project goals: • Deposit coplanar electrodes on the surface of an optical fiber • Use these electrodes as a mask to remove the optical core and replace it with an electro-optic polymer waveguide • Remove excess polymer from surface of fiber • Develop system to attach voltages to the electrodes MME Project: Fiber Patterning
Equipment and Processes Equipment • Pattern generator • Canon mask aligner • E-beam evaporator • Bruce Furnace. • PECVD • Matrix Etcher • RIE MME Project: Fiber Patterning
Equipment and Processes Equipment Processes • Pattern generator -Chemical etching • Canon mask aligner -Photolithography • E-beam evaporator -SEM imaging • Bruce Furnace -Growth of nitrides • PECVD • Matrix Etcher • RIE MME Project: Fiber Patterning
Procedure: Wafer island MME Project: Fiber Patterning
Procedure: V-Groves SEM image MME Project: Fiber Patterning
Procedure: V-Groves MME Project: Fiber Patterning
Procedure: photolithography MME Project: Fiber Patterning
Procedure: Access to the core • D-surface must be level with the core. Two reasons: • We want to remove the core • The electrodes will create an E-field strongest at their center • Fiber section dipped in HF for 20 min. E-Field MME Project: Fiber Patterning
Procedure: Bonding pads • We’ve got to put a voltage on the electrodes Glass Key Section of replaced core 2 cm. MME Project: Fiber Patterning
Results so far MME Project: Fiber Patterning
Results so far SEM Image MME Project: Fiber Patterning
MME Collaboration • New mask: • New design with bonding pads: Cadence • Pattern generator • Photolithography: Photoresist/Polymer application and adhesion • SEM characterization • RIE Etching MME Project: Fiber Patterning