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Engineering 43. FETs-1 (Field Effect Transistors) . Bruce Mayer, PE Registered Electrical & Mechanical Engineer BMayer@ChabotCollege.edu. Learning Goals. Understand the Basic Physics of MOSFET Operation Describe the Regions of Operation for a MOSFET Device
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Engineering 43 FETs-1(Field Effect Transistors) Bruce Mayer, PE Registered Electrical & Mechanical EngineerBMayer@ChabotCollege.edu
Learning Goals • Understand the Basic Physics of MOSFET Operation • Describe the Regions of Operation for a MOSFET Device • Use the Graphical LOAD-LINE method to analyze the operation of basic MOSFET Amplifiers • Determine the LARGE-SIGNAL Bias-Point (Q-Point) for MOSFET circuits
Learning Goals • Use SMALL-SIGNAL models to analyze various FET Amplifiers • Calculate Performance Metrics for various FET Amplifiers • Apply FETs to the Design and Construction of CMOS Logic Gates
Transistor What is it? • Transistor is a contraction for “Transfer Resistor” • These devices have THREE connections: • Input • Output • Control • The transistor’s Fluidic-Analog is a Metering (Needle) Valve (a Faucet)
The concept of voltage-controlled resistance • An independent Voltage Applied to the Control connection (the “Gate) regulates the flowof Current Thru the device Drain (or Source) Gate Source (or Drain)
Flavors of FETS • Junction Field Effect Transistor → JFET • A Normally ON transistor • Reverse Biasing two PN Junctions will “Pinch Off” a Conducting Channel
Flavors of FETS • Depletion ModeMOSFET • Another Normally ON transistor • Applying a Gate Voltage Drives Carriers OUT of the conducting Channel to turn off the transistor • No direct Gate↔Channel Connection • An IsulatedGate Field Effect Transistor (IGFET)
Flavors of FETS • Enhancement Mode MOSFET • Normally OFF transistor • Another IGFET • Applying a Gate Voltage Attracts & Creates carriers to FORM a conducting Channel to turn ON the transistor • These Make Great Switches
MOSFET What does that mean? • M → Metal • O → Oxide • S → Silicon • F → Field • E → Effect • T → Transistor • Short for “Transfer Resistor”
Insulated Gate Field Effect Transistors are Normally-Off devices Enhancement Mode - IGFET • Applying a Positive Voltage to the Gate will attract e−to the Channel • This will eventually “invert” a thin region below the gate to N-type, creating a conducting channel between S & D • IGFETs are Great Switches • Used in almost all digital IC’s • Back-to-Back PN Jcns Between “source” & “drain”
MOSFET Nomenclature & Dims • We will consider only Enhancement FETs n+ ≡ Heavily Doped n-Type An n-Channel (nFET) enhancement mode FET
MOSFET: Current & Speed • In General the performance of an Enhancement Mode MOSFET • Current Carrying Capacity Increases with Increasing Width, W • On/Off Switching Speed Increases with Decreasing Gate Length, L • As of 2011 the minimum (best) value for L was about 22 nm
MOSFET On/Off Operation Step 1: Apply Gate Voltage SiO2 Insulator (Glass) Gate Source Drain 5 volts holes N N electrons P electrons to be transmitted Step 3: Channel becomes saturated with electrons. Electrons in source are able to flow across channel to Drain. Step 2: Excess electrons surface in channel, holes are repelled.
nMOSFET Circuit Symbol • n-Channel MOSFET • electrons move from Source→Drain to produce the Drain Current • PN Junction forms between Substrate and Channel when FET is “ON”
MOSFET Operation: CutOff • As seen in previous diagrams, unpowered MOSFETS have two OPOSING PN junctions • Channel→Source • Channel→Drain • With NO Potential applied to the gate No current can flow • From the Previous slide the Minimum Gate Voltage required for current-flow is called the “Threshold” Voltage, Vto or Vth • A MOSFET with VGS < Vth is “CutOff” • i.e.; The MOSFET is Off, and the Drain Current, iD = 0
MOSFET Circuit in CutOff • The Diagram at Right shows an nMOSFET in CutOff • For vGS<Vto the PN Jcn between the Drain & Body is Reversed Biased by vDS and NO Current flows • Vto is typically 0.5-5 Volts • Mathematically this is simple; in CutOff, the Drain Current
CutOff Summarized • VGS < Vto→ No Drain Current Flows
MOSFET IN Triode (Ohmic) Region • In this case the nMOSFET Voltage conditions: • Electrons are ATTRACTED to the Positive-Gate and a thin Conducting Channel Forms • In this Region the Drain Current depends on BOTH vDS and vGS • Fluid Analogy → needle valve
nMOSFET in Triode Operation • When vGS > Vto a conducting channel forms below the gate
Triode Operation • When vGS > Vto a conducting channel forms below the gate. • That is the “type” of the silicon is INVERTED from p-Type to n-Type • Thus this conducting Channel is often called an “Inversion Layer” • The greater vGS The more the conducting the channel becomes • The Channel resistance is a fcn of vGS
Triode Operation • In the Triode Region, iD increases for • Increasing vGS • Increasing vDS • Thus current thru the device depends on the voltage at ALL three connections as long as vDS < (vGS − Vto) • The Three-Connection dependency is why this region is called TRIODE
Triode Operation • In Triode Operation, the iD curve is a concave-down Parabola given by • Where • The Device Transconductance Parameter, KP, Depends on the Construction of the FET • KP for nFETs is typically 10-100 µA/V2
PinchOff • In order to form a complete channel, every point, x, along the channel must have a voltage difference greater than Vto • That is, need • The greater this qty, the thicker the conducting Layer • Now as vDS is increased eventually at x = L where vchan = vDS • The Channel Thickness goes to ZERO. This is called PINCH-OFF
PinchOff Illustrated • The layer is THICKEST at the Source and ZERO at the Drain when • Thus Have PinchOff when • At this Point the channel is Very Thick at the Source-End, and Zero-Thick at the Drain End → Pinched Offat Drain
TriOde Region Summarized • vDS≤ (vGS − Vto) → iD = f(vDS, VGS) Start of TriOde→ Channel Formation Finish of TriOde→ DrainPinchOff
PinchOff iD Saturation • As vDS increases the “PinchOff Point”, xpop, Moves BACKWARDS towards the Source • Once the channel Pinches Off, the drain current, iD, NO Longer increases with increasing vDS • In other words, for a given vGS, the Current “Saturates” (stays constant) After PinchOff as shown below
MOSFET Operation Summary • Cut-Off Region – In this region the gate voltage is less than the Threshold voltage Vto and therefore very little current flows. • Triode Region – In this mode the device is operating below pinch-off and is effectively a variable resistor. • Saturation Region – This is the main operating region for the device. The drain voltage has to be greater than the gate voltage minus the Threshold voltage.
Operation in Saturation • Notice that in SAT iD varies with vGS • Note that vDS does NOT appear in this Equation • vDS (on vi curve) does NOT affect iD after Channel-PinchOff • In SAT a MOSFET is true 3-terminal device; current depends ONLY on the CONTROL Signal, vGS
Saturation Summarized • vDS≥ (vGS − Vto) → iD ≠ f(vDS) PinchOffMoved BACK from Drain
Triode↔Saturation Boundary • At the boundary Line the nMOSFET just Barely Pinches Off at the Drain end thus: • By KVL • Substituting Find • Or at the Boundary • Sub for vGS into iD,satEqn Boundary Line
Triode↔Saturation Boundary • Then then iD along the Boundary • The Boundary is described by a Concave-UP Parabola that passes thru the origin Boundary Line
Example 12.1 make vi Plot • Use Parameters from Example 12.1 to plot in MATLAB the vi Curve for an nMOSET • The Parameters • W = 160 µm • L = 2 µm (pretty large) • KP = 50 µA/V2 • Vto = 2V • Plot has multiple operating regions → must concatenate
% Bruce Mayer, PE % ENGR43 * 14Jan12 % file = nMOSFET_Plot_ex12_1_1201.m W = 160; % µm L = 2; % µm KP = 50; % µA/sq-V Vto = 2' % V % % calc Parameter K K = (W/L)*KP/2; % µA/sqV) % % set vGS values that exceed CutOff at 2V vGS = [3, 4, 5, 6]; % % calc boundary Triode/Sat boundary by finding iD at the START of sat % region iDsat_uA = K*(vGS-Vto).^2; % in µA iDsat_mA = iDsat_uA/1000 % % show cutoff line vDSco = linspace(0,10, 200); iDco = zeros(200); % DeBug Command => plot(vDSco, iDco, 'LineWidth', 3) % % Calc iD in Triode Region for vGS>Vto (Pinched off at Drain) %* use eqn (12.6) in text vDSsat = sqrt(iDsat_uA/K) % must take care with units % plot(vDSsat,iDsat_mA, '--*', 'LineWidth', 3), grid, xlabel('vDSsat'), ylabel('iDsat') disp('showing Triode-Sat Boundary - Hit any key to continue') pause % MATLABCode-1
MATLABCode-2 % then iD in triode region vDSt1 = linspace(0, vDSsat(1)); % V vDSt2 = linspace(0, vDSsat(2)) vDSt3 = linspace(0, vDSsat(3)) vDSt4 = linspace(0, vDSsat(4)) iDt1_mA = K*(2*(vGS(1)-Vto)*vDSt1-vDSt1.^2)/1000; % mA iDt2_mA = K*(2*(vGS(2)-Vto)*vDSt2-vDSt2.^2)/1000; % mA iDt3_mA = K*(2*(vGS(3)-Vto)*vDSt3-vDSt3.^2)/1000; % mA iDt4_mA = K*(2*(vGS(4)-Vto)*vDSt4-vDSt4.^2)/1000; % mA % % % DeBug Command =>plot(vDSt1,iDt1_mA, vDSt4,iDt4_mA) % % use TwoPoint Plots in Sat iDsat1 =[iDsat_mA(1),iDsat_mA(1)] iDsat2 =[iDsat_mA(2),iDsat_mA(2)] iDsat3 =[iDsat_mA(3),iDsat_mA(3)] iDsat4 =[iDsat_mA(4),iDsat_mA(4)] vDSsat1 = [vDSsat(1), 10] vDSsat2 = [vDSsat(2), 10] vDSsat3 = [vDSsat(3), 10] vDSsat4 = [vDSsat(4), 10] %
MATLABCode-3 % % Now Concatenate to ocver Triode & Saturation Regions iD1 = [iDt1_mA,iDsat1] vDS1 = [vDSt1, vDSsat1] iD2 = [iDt2_mA,iDsat2] vDS2 = [vDSt2, vDSsat2] iD3 = [iDt3_mA,iDsat3] vDS3 = [vDSt3, vDSsat3] iD4 = [iDt4_mA,iDsat4] vDS4 = [vDSt4, vDSsat4] % % % Finally Make Plot plot(vDSco, iDco,'b', vDS1, iD1,'c', vDS2, iD2,'g', vDS3, iD3,'m', vDS4, iD4,'r', 'LineWidth', 3),... grid, xlabel('vDS (Volts)'), ylabel('iD (mA)'), title('nMOSFET vi Curve - Ex 12.1'),... gtext('VGS<Vto'), gtext('vGS=3V'), gtext('vGS=4V'), gtext('vGS=5V'), gtext('vGS=6V')
pMOSFET pMOSFETCircuitSymbol • A “pMOS” FET is the “Complement” to the nMOS version. • The channel is normally n-Type and a hole-populated conducting Channel is formed by applying a NEGATIVE vGS • Basically the pMOS version looks like the nMOS FET with voltage-polarities inverted Channel
All Done for Today 3 & 4ConnectionnFET
Engineering 43 AppendixDiode vi Curves Bruce Mayer, PE Registered Electrical & Mechanical EngineerBMayer@ChabotCollege.edu