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X-Ray Photoelectron Spectroscopy to Examine Molecular Composition. Amy Baker R. Steven Turley Brigham Young University. Why Extreme Ultraviolet?. Thin Film or Multilayer Mirrors. EUV Lithography. Soft X-Ray Microscope. Earth’s Magnetosphere in the EUV.
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X-Ray Photoelectron Spectroscopy to Examine Molecular Composition Amy Baker R. Steven Turley Brigham Young University
Why Extreme Ultraviolet? Thin Film or Multilayer Mirrors EUV Lithography Soft X-Ray Microscope Earth’s Magnetosphere in the EUV Images from www.schott.com/magazine/english/info99/ and www.lbl.gov/Science-Articles/Archive/xray-inside-cells.html.
Why Thorium? • Only one oxidation state: ThO2 • Rock stable: Highest melting point (3300 deg C) of any known oxide. • High Reflectance in the EUV (10-100nm)
Will Thorium Work? • The mirror’s surface will be oxidized. • At optical wavelengths, this oxidation is negligible. It is a major issue for our thin films, however. • We expect minimal oxidation
Purposes of X-Ray Photoelectron Spectroscopy • Learn oxidation state of our thorium samples • Understand how composition changes with depth • Obtain an expression for oxidation as a function of depth
Th 4f5/2 4f7/2 Th O 4d3/2 4d5/2 1s Th C 5d3/2 5d5/2 1s Electron Binding Energy
Peak Shifts • Thorium peaks on surface • Thorium peaks after oxygen is gone
e- X-ray Source Analyzer θ e- e- Sample Depth Profiling • Rastering: Argon ions knock off individual atoms • Variable angle scans: More depth is obtained as x-ray gun and detector are moved towards incidence
Variable Angle Results • Only penetrates about 150 Angstroms into the sample • This allows us to see surface contamination, but not composition with depth • Results are averaged: cannot obtain resolved composition with depth
Too Much Oxidation • These samples were only a few hours old. • We need more uniformity. • Solution: Make ThO2 mirrors. Reflection is similar to Th and it should be more uniform.
Results • Fully oxidized thorium is much more uniform. • ThO2 shows definite promise as a durable reflector in the EUV. • Rastering is an effective depth profiling technique • Variable angle can be used as a surface technique
Continued Research • Include modeled interface in calculating optical constants from reflectance data • Shape of sputtered area may affect rastering rate: use multilayer thin film stack to explore shape of sputtered region
Acknowledgements A special thanks to R. Steven Turley David Allred Matt Linford Yi Lang BYU Thin Films Group Physics & Astronomy Department Funding ORCA Mentoring Grant NASA Space Grant
Other Results of Interest • There was an increase in oxygen when the sample sat for more than 4 or 5 minutes in between sputtering/scans. • This was observed for 5 out of 5 samples that sat still between scans.
* indicates where the sample stood for more than 4 or 5 minutes in between scans
What Could This Be? • Hypothesis: This is likely due to preferential sputtering. • The argon ions will knock off oxygen atoms more readily than thorium. • While sputtering, scans would show less O than actually exists.
Future Research • Test preferential sputtering hypothesis. • Investigate other peak anomalies: N, Ar • Obtain accurate sputtering rates
Future Research • Shape of sputtered area may affect the sputtering rate. • Finally: Make and measure optical constants for thin films of otherelements.